Electrothermal vaporization–inductively coupled plasma mass spectrometry for the analysis of semiconductor-grade organometallic materials and process chemicals

Argentine, Mark D.; Barnes, Ramon M.

doi:10.1039/ja9940901371

Cited by 13 publications

(9 citation statements)

References 21 publications

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“…13 Methods that have been developed for detecting Mn and Zn impurities include graphite furnace atomic absorption spectrometry (GFAAS), inductively coupled plasma mass spectrometry (ICP-MS), total reflection X-ray fluorescence (TXRF) spectrometry, and secondary ion mass spectrometry (SIMS). [14][15][16][17] However, these methods suffer from the shortcomings 11,18,19 of the need to develop the decomposition method for the photoresist. They also require high sensitivity for the instrument and are cumbersome in determining spectroscopic interference.…”

mentioning

confidence: 99%

Characterization and Modeling of Out‐Diffusion of Manganese and Zinc Impurities from Deep Ultraviolet Photoresist

Wang

Ko²,

Wang

et al. 1999

J. Electrochem. Soc.

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The radioactive tracer technique was applied to investigate the out-diffusion of manganese and zinc impurities from deep-ultraviolet (DUV) photoresist. Two important process parameters, viz., baking temperature and the type of substrate (i.e., bare silicon, polysilicon, oxide, or nitride), were evaluated. Our results indicated that diffusion ratios were all below 6%, irrespective of the substrate type and baking temperature. The substrate type did not appear to strongly affect the metallic impurity out-diffusion from DUV photoresist. However, solvent evaporation was found to have a significant effect on impurity diffusion. A new model, together with a new parameter, was proposed to describe the out-diffusion behavior of impurities from DUV photoresist. This model could explain the diffusion ratio of metallic impurities in photoresist layers under various baking conditions. The effectiveness of various wet cleaning recipes in removing metallic impurities such as manganese and zinc was also studied. It was found that (i) bath life due to temperature change can considerably affect the cleaning efficiency, and (ii) hot water immersion can effectively dissolve the impurities from the wafer surface.

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mentioning

confidence: 99%

Characterization and Modeling of Out‐Diffusion of Manganese and Zinc Impurities from Deep Ultraviolet Photoresist

Wang

Ko²,

Wang

et al. 1999

J. Electrochem. Soc.

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“…7 X-ray fluorescence (XRF) and laser ablation inductively coupled plasma mass spectrometry (LA-ICP-MS) have been compared for silicon determination in airborne particulate matter. 8 The detection limit obtained for XRF was 58 mg g 21 . LA-ICP-MS provides a better detection limit (3 mg g 21 ), but poor reproducibility is reported.…”

Section: Introductionmentioning

confidence: 93%

“…8 The detection limit obtained for XRF was 58 mg g 21 . LA-ICP-MS provides a better detection limit (3 mg g 21 ), but poor reproducibility is reported. 8 In addition, both methods rely on the availability of appropriate reference materials for calibration.…”

Section: Introductionmentioning

confidence: 93%

Direct determination of trace amounts of silicon in polyamides by means of solid sampling electrothermal vaporization inductively coupled plasma mass spectrometry

Resano

Verstraete

Vanhaecke

et al. 2002

J. Anal. At. Spectrom.

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“…It is generally accepted that the use of ICP-MS as the detection system results in a higher influence of matrix effects, [17][18][19] making it more difficult to use external calibration with aqueous standards. However, it can be noticed that here also the first papers published on this topic usually recommended the use of external calibration with solid materials, [20][21][22][23] while in later papers solution-based calibration procedures have been proposed (including internal standardization, single standard addition and isotope dilution), 5,6,[24][25][26][27][28][29] and even the simplest calibration approach (external calibration with aqueous standards) has proved to be successful on occasions as a better insight into the real possibilities of the method has enabled a reduction of the influence of matrix effects.…”

Section: Introductionmentioning

confidence: 99%

Evaluation of solid sampling-electrothermal vaporization-inductively coupled plasma mass spectrometry and solid sampling-graphite furnace atomic absorption spectrometry for the direct determination of Cr in various materials using solution-based calibration approaches

Resano

García-Ruiz

Vanhaecke

et al. 2004

J. Anal. At. Spectrom.

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In this work, the possibilities for the direct determination of Cr in solid samples by means of graphite furnace atomic absorption spectrometry (SS-GFAAS) and by means of electrothermal vaporization-inductively coupled plasma mass spectrometry (SS-ETV-ICPMS) have been critically evaluated and compared, the goal always being to develop simple and fast methods, only relying on the use of aqueous standards for calibration. Four reference materials of very different nature (milk powder, lobster hepatopancreas, polyethylene and sewage sludge), covering a wide Cr concentration range (from 17.7 ng g 21 to 37.2 mg g 21 ), were selected for the study. The diverse volatility of their matrixes, compared with that of Cr, resulted in different degrees of difficulty for both techniques. SS-GFAAS offers a better limit of detection (2 ng g 21 ) than SS-ETV-ICPMS (30 ng g 21 ), mainly due to the occurrence of C-based polyatomic interferences with the latter technique. The samples that presented the least difficulties were those for which the matrix is mainly of an organic nature and can be easily removed during the pyrolysis step, allowing a selective atomization/vaporization of the analyte. Under these circumstances, external calibration against aqueous standards was feasible for SS-GFAAS in all cases. SS-ETV-ICPMS proved to be more sensitive to matrix effects, but the use of the palladium (added for its carrier properties) signal as internal standard also allowed the use of this straightforward calibration procedure. On the other hand, the analysis of sewage sludge (containing 85% of hardly volatile inorganic compounds) represented the most complicated situation for both techniques: for SS-GFAAS, the addition of Na 2 CO 3 to effect an in-situ microfusion of the sample during the pyrolysis step greatly helped to improve the situation, while for SS-ETV-ICPMS the single standard addition method was necessary. In all cases, a good agreement with the certified values was obtained. The precision ranged between 6 and 22% relative standard deviation, depending on the homogeneity and the sample mass used. These values could be further improved, if needed, by increasing the number of replicates per determination (usually five). Every determination required approximately 15-20 min, except when the single standard addition method was used (30-40 min). Therefore, it can be stated that both techniques show the capability of providing a direct determination of this analyte in a variety of samples, at very different concentration levels, allowing the development of fast and reliable solid sampling procedures.

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Electrothermal vaporization–inductively coupled plasma mass spectrometry for the analysis of semiconductor-grade organometallic materials and process chemicals

Cited by 13 publications

References 21 publications

Characterization and Modeling of Out‐Diffusion of Manganese and Zinc Impurities from Deep Ultraviolet Photoresist

Characterization and Modeling of Out‐Diffusion of Manganese and Zinc Impurities from Deep Ultraviolet Photoresist

Direct determination of trace amounts of silicon in polyamides by means of solid sampling electrothermal vaporization inductively coupled plasma mass spectrometry

Evaluation of solid sampling-electrothermal vaporization-inductively coupled plasma mass spectrometry and solid sampling-graphite furnace atomic absorption spectrometry for the direct determination of Cr in various materials using solution-based calibration approaches

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