Application of free-standing multilayer films as polarizers for X-ray radiation

Andreev, S. S.; Bibishkin, M. S.; Чхало, Н. И.; Lopatin, A. Ya.; Luchin, V. I.; Pestov, A. E.; Prokhorov, K. A.; Salaschchenko, N.N.

doi:10.1016/j.nima.2005.01.252

Cited by 18 publications

(4 citation statements)

References 5 publications

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“…The absolute photon number in the harmonic spectra is calculated using the idealized spectrograph throughput (shown by the dashed line in Fig. S2b), which is the product of the toroidal mirror reflectivity (calculated using the atomic scattering factors 31,32 ), filter transmission 33 (calculated, the measured transmission at several wavelengths agrees well with the calculation), grating efficiency, 34 and CCD quantum efficiency. 35 The background has been carefully subtracted.…”

Section: Absolute Photon Number and Noise Calculationmentioning

confidence: 99%

Soft-X-Ray Harmonic Comb from Relativistic Electron Spikes

Pirozhkov¹,

Kando²,

Esirkepov³

et al. 2012

Phys. Rev. Lett.

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We demonstrate a new high-order harmonic generation mechanism reaching the "water window" spectral region in experiments with multiterawatt femtosecond lasers irradiating gas jets. A few hundred harmonic orders are resolved, giving μJ/sr pulses. Harmonics are collectively emitted by an oscillating electron spike formed at the joint of the boundaries of a cavity and bow wave created by a relativistically self-focusing laser in underdense plasma. The spike sharpness and stability are explained by catastrophe theory. The mechanism is corroborated by particle-in-cell simulations.

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Section: Absolute Photon Number and Noise Calculationmentioning

confidence: 99%

Soft-X-Ray Harmonic Comb from Relativistic Electron Spikes

Pirozhkov¹,

Kando²,

Esirkepov³

et al. 2012

Phys. Rev. Lett.

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“…A crossed MLM system in the Kirkpatrick-Baez geometry provides nanofocusing of synchrotron radiation (Mimura et al, 2010). Multilayers on transparent substrates or even free-standing structures are used as beam splitters, polarizers, soft X-ray phase shifters and filters for the suppression of long-wavelength radiation (Kortright & Underwood, 1990;Andreev et al, 2005;Chkhalo et al, 2016). High-precision aspherical MLMs are the basis for lithographic facilities that provide the most advanced technological standards for the production of chips (AnandTech https://www.anandtech.com/show/14695/samsungs-aggressiveeuv-plans-6nm-production-in-h2-5nm-4nm-on-track) and telescopes for diagnostics of the solar corona (Golub et al, 1990;Pesnell et al, 2012).…”

Section: Introductionmentioning

confidence: 99%

Intrinsic roughness and interfaces of Cr/Be multilayers

Плешков¹,

Чхало²,

Полковников³

et al. 2021

J Appl Crystallogr

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The structures of Cr/Be multilayer mirror interfaces are investigated using X-ray reflectometry, diffuse X-ray scattering and atomic force microscopy. The combination of these methods makes it possible to separate the contributions of roughness and interlayer diffusion/intermixing for each sample. In the range of period thicknesses of 2.26–0.8 nm, it is found that the growth roughness of the Cr/Be multilayer mirrors does not depend on the period thickness and is ∼0.2 nm. The separation of roughness and diffuseness allows estimation of layer material intermixing and the resulting drop in the optical contrast, which is from 0.85 to 0.17 in comparison with an ideally sharp structure.

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“…In order to make a free-standing ML, the SiN or SiC membrane is also etched away, e.g. with dry-reactive ion etching (Haga et al, 1998(Haga et al, , 2000Takenaka et al, 2005;Andreev et al, 2005;MacDonald et al, 2008MacDonald et al, , 2009. Another method to make freestanding ML-BSs is by using the photoresist or another sublayer that is dissolved and the ML is subsequently lifted off and remounted onto a frame (Kortright et al, 1992;Kimura et al, 2005;Volodin et al, 2010;Nomura et al, 1992).…”

Section: Current State Of Ml-bs Technologymentioning

confidence: 99%

Mo/Si multilayer-coated amplitude-division beam splitters for XUV radiation sources

Sobierajski

Loch

Kruijs

et al. 2013

J Synchrotron Radiat

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Amplitude-division beam splitters for XUV radiation sources have been developed and extensively characterized. Mo/Si multilayer coatings were deposited on 50 nm-thick SiN membranes. By changing the multilayer structure (periodicity, number of bilayers, etc.) the intensity of the reflected and transmitted beams were optimized for selected incident radiation parameters (wavelength, incident angle). The developed optical elements were characterized by means of XUV reflectometry and transmission measurements, atomic force microscopy and optical interferometry. Special attention was paid to the spatial homogeneity of the optical response and reflected beam wavefront distortions. Here the results of the characterization are presented and improvements required for advanced applications at XUV free-electron lasers are identified. A flatness as low as 4 nm r.m.s. on 3 Â 3 mm beam splitters and 22 nm r.m.s. on 10 Â 10 mm beam splitters has been obtained. The high-spatialfrequency surface roughness was about 0.7-1 nm r.m.s. The middle-spatialfrequency roughness was in the range 0.2-0.8 nm r.m.s. The reflection and transmission of the beam splitters were found to be very homogeneous, with a deviation of less than 2% across the full optical element.

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Application of free-standing multilayer films as polarizers for X-ray radiation

Cited by 18 publications

References 5 publications

Soft-X-Ray Harmonic Comb from Relativistic Electron Spikes

Soft-X-Ray Harmonic Comb from Relativistic Electron Spikes

Intrinsic roughness and interfaces of Cr/Be multilayers

Mo/Si multilayer-coated amplitude-division beam splitters for XUV radiation sources

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