We present research investigations in the eld of multilayer optics in X-ray and extreme ultra-violet ranges (XUV), aimed at the development of optical elements for applications in experiments in physics and in scienti c instrumentation. We discuss normal incidence multilayer optics in the spectral region of \water window", multilayer optics for collimation and focusing of hard X-rays, multilayer dispersing elements for X-ray spectroscopy of high-temperature plasma, multilayer dispersing elements for analysis of low Z-elements. Our research pays special attention to optimization of multilayer optics for projection EUV-lithography ( ¶ = 13nm) and short period multilayer optics.

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The technique for fabrication of thin film filters with high mechanical strength, capable of withstanding the prolonged heat load of 1 W/cm 2 , has been developed. Freestanding multilayer Zr/Si filters of size 20 150 mm 2 with high transparency of 76% at wavelength = 13 nm were manufactured for EUV lithography tool. We have also developed and fabricated various designs of filters (freestanding or mesh supported) with lower transparency of 40-50% for experiments with intensive EUV sources. The tests of differential pressure withstandability and heat-resistance of filter samples were fulfilled. In order to model the influence on the filter of intensive radiation of the lithography source we have tested Zr/Si film samples by the Joule heating in vacuum at residual pressure of 10 -8 Torr. The testing consisted in continuous heating of Zr/Si films at the electrical power per area unit from 0.5 W/cm 2 to 6 W/cm 2 during long period of time (up to 2 months). The influence of the long-term heat load on the transparency of samples at = 13 nm and within wavelength region 0.3 -2 m was investigated.

Multilayer structures with short periods have been systematically investigated using a tunable soft X-ray synchrotron, BESSY II, and X-ray tube radiation. Multilayer X-ray mirrors of W/B(4)C, W/Sc, Mo/B(4)C, Mo/C, La/B(4)C, Cr/C and Cr/Sc, with periods from 0.8 nm to 3.5 nm and number of periods up to 300-400, were constructed and investigated. The high reflectivity and spectral resolution of the mirrors allow them to be used to create multimirror systems for X-ray diagnostics of high-temperature plasma, for X-ray astronomy and microscopy.

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