Multilayer optics for XUV spectral region: technology fabrication and applications

Andreev, S. S.; Akhsakhalyan, A. D.; Bibishkin, M. S.; Чхало, Н. И.; Gaponov, S. V.; Gusev, S. A.; Kluenkov, E. B.; Prokhorov, K. A.; Салащенко, Н. Н.; Schäfers, F.; Zuev, S. Yu.

doi:10.2478/bf02475561

Cited by 44 publications

(32 citation statements)

References 48 publications

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“…We also developed a novel fabrication process based on UV-NanoImprint Lithography and Bosch Deep Reactive Ion Etching, which provided reproducible and cost-effective fabrication of single-order operating LMGs with grating periods down to 200 nm. With our LMGs, we achieved spectral resolutions E/ΔE of up to 330 as compared to previously reported values of 70 [13] for conventional ML mirrors.…”

Section: Motivationsupporting

confidence: 55%

“…However, absorption in the SXR is actually relatively high and maximum SXR path lengths through materials are in the order of only a few μm. This limits N ef f , resulting in typical spectral resolutions around 50-100 [13]. Besides the spectral resolution, the peak reflectivity is also of great importance when characterizing a ML mirror to provide as much intensity in the reflected beam as possible.…”

Section: Multilayer Mirrorsmentioning

confidence: 99%

“…The resulting emitted fluorescent radiation is then analyzed using a wavelength dispersive Bragg structure, typically a natural crystal or ML mirror, and an x-ray detector. ML mirrors used in the soft x-ray spectral range generally can achieve spectral resolutions in the order of 50-100 [13]. However, various elements and isotopes have closely spaced shell emission lines that require spectral resolutions of at least a few hundred to be resolved [24].…”

Section: X-ray Fluorescence Spectroscopymentioning

confidence: 99%

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Single-order lamellar multilayer gratings

Meer¹

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Cover: 3D artist impression of a Lamellar Multilayer Grating (LMG). A Transmission Electron Microscope image of an actual LMG is shown on the rear. The grating was etched into a 400 bi-layer W/Si multilayer mirror with a total stack height H of 1 μm and a tungsten layer thickness of only 3 atoms. The grating had a period D of 300 nm and a lamel width ΓD of 75 nm. In comparison to the TEM image on the rear, the red and green layers in the artist impression correspond to tungsten and silicon, respectively. The bi-layer period in the artist impression is overestimated by a factor of 10 for visibility. SummaryA major challenge in the soft x-ray (SXR) and eXtreme UltraViolet (XUV) spectral ranges is the ability to manipulate the incident radiation using optical elements. By patterning conventional multilayer mirrors with nanoscale structures, novel optical elements with a variety of optical properties can be obtained. In this work, the design, fabrication and characterization of Lamellar Multilayer Gratings (LMG) was investigated. Such LMGs are a particular form of the general class of Bragg-Fresnel optics which combine Fresnel optics with Bragg reflection to provide unique dispersive and focusing optics. In particular, LMGs can be used to improve the spectral resolution of x-ray fluorescence techniques.A Coupled Waves Approach (CWA) was derived to simulate the optical performance, in terms of resolution and reflectivity, of LMGs. This CWA allowed to study the physical principles behind LMGs and resulted in the identification of an optimal LMG operating regime. In this regime, the incident beam is reflected in a single diffraction order and is hence referred to as the singleorder regime. Such single-order LMGs were fabricated using UV-NanoImprint Lithography and Bosch Deep Reactive Ion Etching, a process chosen to enable rapid practical development. Single-order operation was experimentally demonstrated and showed an improvement in spectral resolution of a factor of 3.8 with regard to conventional multilayer mirrors. Singe-order excitation of higher diffraction orders was also measured and analyzed.Single-order operation often requires multilayer stacks and grating structures that cannot be fabricated with sufficient accuracy using current technologies. As this invalidates the semi-infinite multilayer approximation, we investigated the optical performance of LMGs with finite multilayer stacks. We determined the ratio between the absorber thickness and bi-layer period of the multilayer stack can be used to further tailor LMG optical performance to maximize bandwidth reduction or minimize peak reflectivity loss. We also investigated various degradation processes that could limit the lifetime of LMGs, which is important for the applicability of such elements. Oxidation of tungsten and silicon as well as changes to the sidewall composition were clearly seen. However, SXR reflectivity remained stable to within measurement accuracy for an extended storage period of 18 months in a 1 atm air environment. The possibility of ...

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Section: Motivationsupporting

confidence: 55%

Section: Multilayer Mirrorsmentioning

confidence: 99%

Section: X-ray Fluorescence Spectroscopymentioning

confidence: 99%

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Single-order lamellar multilayer gratings

Meer¹

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“…It allows manufacturing optics for a whole x-ray and extreme ultra-violet spectral range. More details about the properties of the multilayer structures can be found in (Andreev et al, 2003). A great volume of works, high requirements for the coating quality and for accuracy of the period distribution over a substrate surface dictate the need for an operative information about characteristics of the deposited coatings with the purpose of correcting the technological process.…”

Section: Reflecting Multilayer Interference Mirrorsmentioning

confidence: 99%

“…However the reflectivity obtained here with La/B 4 C multilayer mirrors at a normal angle of incidence does not exceed 45-47 % (Andreev et al, 2009) that is not enough for lithographic applications. (Website ESRF, 2006;Andreev et al, 2003)) reflection coefficients of mostly attractive pairs of materials in X-ray and EUV ranges.…”

Section: Reflecting Multilayer Interference Mirrorsmentioning

confidence: 99%

Manufacturing and Investigating Objective Lens for Ultrahigh Resolution Lithography Facilities

Чхало¹,

Pestov²,

N.³

et al. 2010

Lithography

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Observations of Solar EUV Radiation with the CORONAS-F/SPIRIT and SOHO/EIT Instruments

et al. 2005

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The SPIRIT complex onboard the CORONAS-F satellite has routinely imaged the Sun in the 171, 175, 195, 284, and 304 Å spectral bands since August 2001. The complex incorporates two telescopes. The Ritchey-Chretien telescope operates in the 171, 195, 284, and 304 Å bands and has an objective similar to that of the SOHO /EIT instrument. The Herschel telescope obtains solar images synchronously in the 175 and 304 Å bands with two multilayer-coated parabolic mirrors. The SPIRIT program includes synoptic observations, studies of the dynamics of various structures on the solar disk and in the corona up to 5 solar radii, and coordinated observations with other spaceborne and ground-based telescopes. In particular, in the period 2002-2003, synoptic observations with the SPIRIT Ritchey-Chretien telescope were coordinated with regular 6-hour SOHO /EIT observations. Since June 2003, when EIT data were temporarily absent ( SOHO keyholes), the SPIRIT telescope has performed synoptic observations at a wavelength of 175 A. These data were used by the Solar Influence Data Analysis Center (SIDC) at the Royal Observatory of Belgium for an early space weather forecast. We analyze the photometric and spectral parameters of the SPIRIT and EIT instruments and compare the integrated (over the solar disk) EUV fluxes using solar images obtained with these instruments during the CORONAS-

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Multilayer optics for XUV spectral region: technology fabrication and applications

Cited by 44 publications

References 48 publications

Single-order lamellar multilayer gratings

Single-order lamellar multilayer gratings

Manufacturing and Investigating Objective Lens for Ultrahigh Resolution Lithography Facilities

Observations of Solar EUV Radiation with the CORONAS-F/SPIRIT and SOHO/EIT Instruments

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