“…For typical NVM devices, the programming/erasing properties depend on the applied voltage to the control gate electrode (V program /V erase ) that leads to validate the memory window with the corresponding variation in the current level of a device as ‘on’ state and ‘off’ state, describing programmable and erasable constitutes of memories [ 7 , 8 , 9 ]. In this regard, floating gate NVM devices based on various semiconductors, such as two-dimensional (2D) materials (molybdenum disulfide (MoS 2 ) and tungsten disulfide (WS 2 )), [ 3 , 8 , 10 , 11 , 12 , 13 ] oxide materials (indium gallium zinc oxide (IGZO) and zinc oxide (ZnO)) [ 9 , 14 , 15 , 16 , 17 , 18 , 19 , 20 ] and organic materials (pentacene, poly(3-hexylthiophene) (P3HT), and dinaphthothienothiophene (DNTT)) [ 21 , 22 , 23 , 24 , 25 , 26 ] have recently been studied, exhibiting high-performance memory operations with greater endurance and retention properties but are still limited at obtaining reliable reproducibility, larger memory window with on-off ratio, low-temperature processing, and easy fabrication methods.…”