Application of scatterometry for evaluation of lithographic process and OPC model generation

Huang, Karen; Lee, Joungchel; Wen, Youxian; Opsal, Jon

doi:10.1117/12.600183

Cited by 3 publications

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Imaging ellipsometry for structured and plasmonic materials

Hingerl

2021

Journal of Applied Physics

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For approximately a decade, imaging ellipsometers have been available commercially. These allow one to measure the properties of graphene flakes, organic layers on amorphous substrates, plasmonic structures, among many other examples. These imaging ellipsometers opened a path to recognize and interpret pattern formations on surfaces or mapping field enhancement. However, for a full understanding of the optical response of patterned substrates, one should be aware that the well-known Fresnel reflection and transmission equations are, strictly speaking, not correct anymore. In this contribution, the ellipsometric response is explained in detail using heuristic physical arguments, hopefully without getting lost in the complexities of numerical computations.

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Imaging ellipsometry for structured and plasmonic materials

Hingerl

2021

Journal of Applied Physics

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Laser Characterization of the Periodic Line-Space Micro/Nano Structures

Iancu

Şchiopu

Manea

et al. 2007

2007 30th International Spring Seminar on Electronics Technology (ISSE)

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Parallel scanning-optical nanoscopy with optically confined probes

Tsai¹,

Thomas²,

Menon³

2010

Opt. Express

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We report the imaging of sub-diffraction limited features using an optical probe generated by focusing a round spot at one wavelength, lambda(1) = 405 nm, and a ring-shaped spot at a second wavelength, lambda(2) = 532 nm, onto a thin photochromic layer that coats the nanostructures. Illumination at lambda(2) turns the photochromic layer opaque to lambda(1) everywhere except at the centre of the ring, where the illumination at lambda(1) penetrates and probes the underlying nanostructure. We confirm that this optically confined probe increases image contrast and is able to resolve features smaller than the far-field diffraction limit. Furthermore, by using an array of dual-wavelength diffractive microlenses, we demonstrate the feasibility of parallelizing this approach. Compared to previous approaches, our technique is not limited to fluorescence imaging.

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Application of scatterometry for evaluation of lithographic process and OPC model generation

Cited by 3 publications

References 0 publications

Imaging ellipsometry for structured and plasmonic materials

Imaging ellipsometry for structured and plasmonic materials

Laser Characterization of the Periodic Line-Space Micro/Nano Structures

Parallel scanning-optical nanoscopy with optically confined probes

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