2019
DOI: 10.1186/s11671-019-3030-y
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Application of Silicon Nanostructure Arrays for 6-inch Mono and Multi-Crystalline Solar Cell

Abstract: In this study, we fabricate uniform silicon nanowire (SiNW) arrays on 6-inch mono- and multi-crystalline wafers by employing the improved solution-processed metal-assisted chemical etching (MacEtch) method. Furthermore, the improved MacEtch can be applied to various crystalline orientation wafers. The SiNW arrays are 470 nm in length with high density; they demonstrate a good optical trapping effect and reflectance well below 6% over a broad wavelength range from 300 to 1100 nm. The improved MacEtch shows no d… Show more

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Cited by 5 publications
(2 citation statements)
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“…The industry needs large area films, nearly 6 × 6 in., with uniform thickness for applications like solar cells. 285,286 However, magnetron suffers from the limitation of producing uniform film over large areas (Table I), with different configurations of magnetic fields and novel racetrack configurations. For transparent electrode applications, the industry needs TCO films to be deposited on a plastic or flexible substrate.…”
Section: Progress and Challenges In Ito Filmsmentioning
confidence: 99%
“…The industry needs large area films, nearly 6 × 6 in., with uniform thickness for applications like solar cells. 285,286 However, magnetron suffers from the limitation of producing uniform film over large areas (Table I), with different configurations of magnetic fields and novel racetrack configurations. For transparent electrode applications, the industry needs TCO films to be deposited on a plastic or flexible substrate.…”
Section: Progress and Challenges In Ito Filmsmentioning
confidence: 99%
“…Except physical processing technology, Chen-Chih Hsueh et. al fabricated uniform silicon nanowire (SiNW) arrays on the mono-and multi-crystalline wafers by employing the improved solution-processed metal-assisted chemical etching (MacEtch) method [79]. They demonstrated a good optical trapping effect and reflectance well below 6% over a broad wavelength range from 300 to 1,100 nm with good uniformity, as shown in Figure 10.…”
Section: Single Photon Detection Systemmentioning
confidence: 99%