Application of the “imaging plate” to TEM image recording

Mori, Nobuhito; Oikawa, Tetsuo; Katoh, Takuji; Miyahara, Junji; Harada, Yoshiyasu

doi:10.1016/0304-3991(88)90014-9

Cited by 88 publications

(21 citation statements)

References 8 publications

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“…TEM images and electron diffraction patterns were recorded on an imaging plate ͑Eu 2+ -doped BaFBr͒, which has a higher sensitivity and a wider dynamic range for electron-beam intensities compared with commercial TEM film materials. 7 The intensities of the electron diffraction patterns were analyzed quantitatively using a Digital MicroLuminography FDL 5000. Fig.…”

Section: Methodsmentioning

confidence: 99%

Ion-beam-induced chemical disorder in GaN

Ishimaru

Zhang

Weber

2009

Journal of Applied Physics

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Atomistic structures of high-energy ion irradiated GaN were examined using transmission electron microscopy (TEM). Single crystalline GaN substrates were irradiated at cryogenic temperatures with 2 MeV Au2+ ions to a fluence of 7.35×1015 Au/cm2. Cross-sectional TEM observations revealed that damaged layers consisting of amorphous and nanocrystalline phases are formed at the surface and buried depth of the as-irradiated GaN substrate. Atomic radial distribution functions of the amorphous/polynanocrystalline regions showed that not only heteronuclear Ga–N bonds but also homonuclear Ga–Ga bonds exist within the first coordination shell. It was found that the ratio of heteronuclear-to-homonuclear bonds, i.e., the degree of chemical disorder, is different between the surface and buried damaged layers. The alternation of chemical disorder was attributed to the difference in the defect formation processes between these layers.

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Section: Methodsmentioning

confidence: 99%

Ion-beam-induced chemical disorder in GaN

Ishimaru

Zhang

Weber

2009

Journal of Applied Physics

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“…TEM studies were performed using two TEMs both operated at 200 kV: a JEM-2010 for high-resolution electron microscopy (HREM) observation and a JEM-3000 F equipped with a field-emission gun for nano-beam electron diffraction. HREM images and nano-beam electron diffraction patterns were recorded on imaging plates (pixel size: 25 lm · 25 lm) [13] which has a higher sensitivity and a wider dynamic range for electron beam intensities compared to conventional TEM films. Electron intensities of hallo electron diffraction patterns were analyzed quantitatively in an imaging plate processor (Fuji Film: FDL-5000).…”

Section: Methodsmentioning

confidence: 99%

Local structural change of amorphous Ge–Sb–Te thin film on annealing

Naito

Ishimaru

Hirotsu

et al. 2004

Journal of Non-Crystalline Solids

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“…Importantly, while many more gamma rays hit the plate than electrons, each electron produces approximately one hundred times the activation in the plate [25]. Then, the averaged value of the background regions is subtracted from each corresponding point in the signal region along the direction of changing energy.…”

Section: Section Iii: Filter Stack Spectrometer Resultsmentioning

confidence: 99%