Application of ultra‐soft X‐ray emission spectroscopy for solid surfaces studies

Shulakov, A. S.

doi:10.1002/crat.2170230623

Cryst. Res. Technol.

1988

DOI: 10.1002/crat.2170230623

|View full text |Cite

Application of ultra‐soft X‐ray emission spectroscopy for solid surfaces studies

A. S. Shulakov

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

Supporting

Mentioning

Contrasting

Year Published

1993

2020

Publication Types

Select...

Article5

Relationship

Self Cite0

Independent5

Authors

Journals

Cited by 17 publications

References 2 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

Ultrasoft x-ray reflection and emission spectroscopic analysis of Al2O3/Si structure synthesized by the atomic layer deposition method

et al. 2006

View full text Add to dashboard Cite

X‐ray reflection spectroscopy and x‐ray emission spectroscopy using electron excitation were used to characterize the 30 nm‐thick Al2O3 film grown on a silicon substrate by atomic layer deposition (ALD). According to our investigations the film was amorphous and inhomogeneous in depth. The interfacial layer between film and substrate that was a mixed layer containing Al2O3, a large amount of the SiO2 and elemental Si was evidenced. The concentration of SiO2 increases as one approaches the Si(100) substrate interface because of the interdiffusion of the oxygen and silicon, followed by silicon oxidation. Copyright © 2006 John Wiley & Sons, Ltd.

show abstract

Ultrasoft x-ray reflection and emission spectroscopic analysis of Al2O3/Si structure synthesized by the atomic layer deposition method

et al. 2006

View full text Add to dashboard Cite

show abstract

Analysis of the depth profile of Fe-Si buried layers in Fe+-implanted Si wafer by soft X-ray emission spectroscopy

Galakhov

Kurmaev

Shamin

et al. 1993

Applied Surface Science

View full text Add to dashboard Cite

Surface oxidation of dilute AlMgSi alloys

Shulakov

Stepanov

Brajko

et al. 1993

Journal of Electron Spectroscopy and Related Phenomena

View full text Add to dashboard Cite

scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.

Contact Info

customersupport@researchsolutions.com

10624 S. Eastern Ave., Ste. A-614

Henderson, NV 89052, USA

This site is protected by reCAPTCHA and the Google Privacy Policy and Terms of Service apply.

Blog Terms and Conditions API Terms Privacy Policy Contact Cookie Preferences Do Not Sell or Share My Personal Information

Made with 💙 for researchers

Part of the Research Solutions Family.

Application of ultra‐soft X‐ray emission spectroscopy for solid surfaces studies

Cited by 17 publications

References 2 publications

Ultrasoft x-ray reflection and emission spectroscopic analysis of Al2O3/Si structure synthesized by the atomic layer deposition method

Ultrasoft x-ray reflection and emission spectroscopic analysis of Al2O3/Si structure synthesized by the atomic layer deposition method

Analysis of the depth profile of Fe-Si buried layers in Fe+-implanted Si wafer by soft X-ray emission spectroscopy

Surface oxidation of dilute AlMgSi alloys

Contact Info

Product

Resources

About