Applications of intense pulsed ion beam to materials science*

Yatsui, Kiyoshi; Kang, Xiangdong; Sonegawa, T.; Matsuoka, Toshimasa; Masugata, Katsumi; Shimotori, Y.; Satoh, Takahiro; Furuuchi, S.; Ohuchi, Y.; Takeshita, T.; Yamamoto, Hirohisa

doi:10.1063/1.870677

Cited by 96 publications

(26 citation statements)

References 11 publications

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“…In this case, the table shown in the figure is replaced by an ablation target. Such thin-film experiments have also been described elswhere [3]. We report here on the analysis of new and novel microstructures formed in such layers.…”

Section: Introductionmentioning

confidence: 92%

Use of Intense Ion Beams for Surface Modification and Creation of New Materials

Renk¹,

Provencio²,

Prasad³

et al. 2002

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up to l Hz repetition rate) at Sandia National Laboratories. Ions are generated by the MAP gas-breakdown active anode, which can yield a number of different beam species including H, N, and C, depending upon the injected gas. Beams of intense pulsed high-power ion beams have been used to produce surface modification by changes in microstructure caused by rapid heating and cooling of the surface. Increase of beam power leads to ablation of a target surface, and redeposition of ablated material onto a separate substrate. Experiments are described in which ion beams are used in an attempt to increase high-voltage breakdown of a treated surface. Surface alloying of coated Pt and Hf layers is also described. This mixing of a previously deposited thin-film layer into a Ti-alloy substrate leads to significantly enhanced surface wear durability, compared to either untreated Ti-alloy alone, or the Ti alloy alone treated with the ion beam. Thin-film layers have been produced from a number of target materials. Films of fine-grain Pt and Er are described, and are compared to conventionally formed films. First attempts to form high-dielectric constant BaTi03 are described.

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Section: Introductionmentioning

confidence: 92%

Use of Intense Ion Beams for Surface Modification and Creation of New Materials

Renk¹,

Provencio²,

Prasad³

et al. 2002

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“…* Hence PHIBs are expected to be applied to surface treatment [1,2], thin-film deposition [3] or implantation processes. In particular, for implantation processes, PHIBs are expected to be used as a new type of technology since ion implantation and surface heat treatment or surface annealing are completed at one and the same time [4,5].…”

Section: Introductionmentioning

confidence: 99%

Generation of an intense pulsed heavy-ion beam by aB_y-type, magnetically insulated ion diode with an active ion source

Masugata

Tejima

Higashiyama

et al. 2005

Plasma Devices and Operations

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A new type of a pulsed heavy-ion beam diode with a new configuration of the acceleration gap and an active ion source of gas puff plasma gun was developed. With the plasma gun, nitrogen plasma was produced and injected into the acceleration gap of the diode. The ion diode was operated at a diode voltage of about 200 kV, a diode current of about 2.0 kA and a pulse duration of about 150 ns. An ion beam with an ion current density of about 13 A cm −2 was obtained 55 mm downstream from the anode. From measurements with the Thomson parabola spectrometer we found that N + and N 2+ beams of 60-300 keV energy were accelerated with proton impurities of 60-150 keV energy. The purity of the beam was estimated to be 87%. To generate metallic ions, a vacuum arc plasma gun was developed and an aluminium plasma with an ion current density of 8 A cm −2 was obtained.

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“…[1][2][3] The development of the HIPIB apparatus has emerged as one of the most crucial issues for practical applications in surface engineering by HIPIB. 4 The HIPIB is usually created in conventional magnetically insulated ion diodes ͑MIDs͒ with transverse magnetic field in the acceleration gap to suppress electron flow and enhance the ion flow.…”

Section: Introductionmentioning

confidence: 99%

Characterization of a high-intensity unipolar-mode pulsed ion source with improved magnetically insulated diode

Zhu

Lei

Dong

et al. 2003

Review of Scientific Instruments

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A magnetically insulated ion diode (MID) with an improved external-magnetic field system has been developed and installed onto a TEMP-6-type high-intensity pulsed ion source in order to produce a high-intensity pulsed ion beam (HIPIB) for surface modification of materials. The external-magnetic field MID is operated in unipolar mode based on dielectric high-voltage flashover, and a double coaxial pulse-forming line (PFL) powered with a Marx generator is used to form the unipolar pulse of nanosecond width. A specially designed cathode has been constructed with a forked connection to two symmetrically installed transformers to improve the effect of the magnetic field and thus increase the stability of generation and propagation of the ion beam. It was found that the efficient generation of HIPIB mainly depended on the magnetic field strength, the gas pressures in reverse and output switches of PFL, and the anode–cathode (A–K) gap of the external-magnetic field MID. A proper magnetic field strength was found with magnetic field power system at dc charging voltage of 8 kV. The proper A–K gap distance is not uniform with the value varied from 6 to 8 mm. Suitable gas pressures for reverse and output switches were about 1.2 and 2.4 atm, respectively, at a charging voltage of 40 kV to the Marx generator. The most efficient plasma generation and ion extraction led to a maximum output of HIPIB with a peak ion current density of 300 A cm−2 and a beam pulse width of 80 ns (full width at half maximum), at an accelerating pulse of 300–350 kV with a pulse width of 70 ns.

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Applications of intense pulsed ion beam to materials science*

Cited by 96 publications

References 11 publications

Use of Intense Ion Beams for Surface Modification and Creation of New Materials

Use of Intense Ion Beams for Surface Modification and Creation of New Materials

Generation of an intense pulsed heavy-ion beam by aB_y-type, magnetically insulated ion diode with an active ion source

Characterization of a high-intensity unipolar-mode pulsed ion source with improved magnetically insulated diode

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Applications of intense pulsed ion beam to materials science*

Cited by 96 publications

References 11 publications

Use of Intense Ion Beams for Surface Modification and Creation of New Materials

Use of Intense Ion Beams for Surface Modification and Creation of New Materials

Generation of an intense pulsed heavy-ion beam by aBy-type, magnetically insulated ion diode with an active ion source

Characterization of a high-intensity unipolar-mode pulsed ion source with improved magnetically insulated diode

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Generation of an intense pulsed heavy-ion beam by aB_y-type, magnetically insulated ion diode with an active ion source