2010
DOI: 10.1117/12.862976
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Applications of Mueller polarimetry in the Fourier space for overlay characterization in microelectronics

Abstract: We present a new optical technique using complete Mueller polarimetry in the back focal plane of a microscope objective to characterize the overlay defects in microelectronics industry. Exploiting the fundamental symmetries in the physics of periodic structures and polarized light and the redundancies in the angle-resolved images we prove that it is possible to measure overlay by this fast and non-destructive technique. The simulations of the one-dimensional structures have shown that the values of a chosen cr… Show more

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Cited by 2 publications
(1 citation statement)
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“…For remote sensing, polarization has been shown to be useful for improving the contrast between polarized targets and background clutter, 1 improving robustness to poor visibility conditions in road scenes, 2,3 and surface defect characterization. [4][5][6] Conventional EO/IR techniques measure the intensity of reflected optical radiation over some wavelength, while polarimetric imaging techniques, instead, measure the polarization state of reflected optical radiation in a scene.…”
Section: Introductionmentioning
confidence: 99%
“…For remote sensing, polarization has been shown to be useful for improving the contrast between polarized targets and background clutter, 1 improving robustness to poor visibility conditions in road scenes, 2,3 and surface defect characterization. [4][5][6] Conventional EO/IR techniques measure the intensity of reflected optical radiation over some wavelength, while polarimetric imaging techniques, instead, measure the polarization state of reflected optical radiation in a scene.…”
Section: Introductionmentioning
confidence: 99%