2022 IEEE 72nd Electronic Components and Technology Conference (ECTC) 2022
DOI: 10.1109/ectc51906.2022.00145
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Approaches for a Solely Electroless Metallization of Through-Glass Vias

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Cited by 3 publications
(1 citation statement)
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“…The metallization of TGVs is typically based on the same approach and is using the same machines which are in use for TSV interposer fabrication. Hence the TGVs are typically metallized by using physical vapor deposition (PVD), chemical vapor deposition (CVD) or electroless deposition for a seed layer inside the via [59], [60]. Other approaches would be using Schott Hermes Glass with integrated tungsten plugs or using pastes, solder or powder to create a conductive path through the wafer [61], [62], [63].…”
Section: Metallizationmentioning
confidence: 99%
“…The metallization of TGVs is typically based on the same approach and is using the same machines which are in use for TSV interposer fabrication. Hence the TGVs are typically metallized by using physical vapor deposition (PVD), chemical vapor deposition (CVD) or electroless deposition for a seed layer inside the via [59], [60]. Other approaches would be using Schott Hermes Glass with integrated tungsten plugs or using pastes, solder or powder to create a conductive path through the wafer [61], [62], [63].…”
Section: Metallizationmentioning
confidence: 99%