Abstract. Manufacturing superconducting circuits out of ultrathin films is a challenging task when it comes to pattern complex compounds, which are likely to be deteriorated by the patterning process. With the purpose of developing high-Tc superconducting photon detectors, we designed a novel route to pattern ultrathin YBCO films down to the nanometric scale. We believe that our method, based on a specific use of a focused ion beam, consists in locally implanting Ga 3+ ions and/or defects instead of etching the film. This protocol could be of interest to engineer high-Tc superconducting devices (SQUIDS, SIS/SIN junctions, Josephson junctions), as well as to treat other sensitive compounds.PACS numbers: 85.25. Am, 81.16.Nd, 74.78.Bz, 81.15.Cd, 85.25.Pb Patterning of ultrathin YBCO nanowires using a new focused-ion-beam process 2