2020
DOI: 10.1541/ieejsmas.140.31
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Area-selective Cu Film Growth on TiN and SiO<sub>2</sub> by Supercritical Fluid Deposition

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Cited by 2 publications
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“…To demonstrate our proposed method, we utilized the SCFD experimental systems in Ref. [26]. SCFD is a promising technology for realizing metallic microstructures [27][28].…”
Section: Experimental Design and Fabricationmentioning
confidence: 99%
“…To demonstrate our proposed method, we utilized the SCFD experimental systems in Ref. [26]. SCFD is a promising technology for realizing metallic microstructures [27][28].…”
Section: Experimental Design and Fabricationmentioning
confidence: 99%