ArF-excimer-laser-induced emission and absorption bands in fused silica synthesized in reducing conditions

Effects induced by 4.7eV UV laser irradiation on pure silica core multimode optical fibers investigated by in situ optical absorption measurements

“…This remarkably contrasts with several experimental evidence (including those of Fig. 1 in the present paper) in favor of reaction (1) taking place only from left to right at temperatures N200 K [6,7,[20][21][22][23][24][25], although requiring an activation energy of ∼0.4 eV which provides the main bottleneck limiting the reaction rate [25].…”

“…Post-irradiation decay of E′ centers on a time scale of a few hours has been previously interpreted as a consequence of its chemical reaction with diffusing H 2 [6,7,[20][21][22][23][24][25]:…”

“…Studies on the response of high-OH fibers to UV light have identified E′ centers as the main generated defects, and have suggested them to arise from photochemical rupture of Si\H precursors [9,10]. Also, the concentration of induced E′ centers was found to be significantly reduced if the fiber is loaded with high concentrations of H 2 [9]; this is likely due to passivation of induced E′ centers due to their reaction with diffusing hydrogen, as observed in bulk SiO 2 [6,7,[20][21][22][23][24][25]. Comparison of these studies with literature on bulk SiO 2 actually suggests quite a similar phenomenology triggered by laser irradiation in the two physical systems.…”

Fs Laser Induced Reversible and Irreversible Processes in Transparent Bulk Material

“…For example, for light-induced modification of fused silica under femtosecond irradiation, the value of the constant ν 0 is more than 10 4 pulses [6,28]. Such a big difference implies that the chemical bonds are perturbed by laser light much more strongly in the case of bismuth-doped glass.…”

Effects of preirradiation and thermal annealing on photoinduced defects creation in synthetic silica glass

“…An urgent problem here is defects creation by UV light irradiation, which brings extra absorption bands and then lowers transmittance in UV region. [4][5][6][7] Commercial bulk silica glass and silica fiber for UV light usually contain OH ions of 300-1200 wt ppm, which suppress to some extent the photoinduced defects creation. [8][9][10][11] The OH ions have been thought to stabilize the glass network by forming stable terminated bonds as Si-O-H from weak Si-O-Si bonds or various pre-existing defects.…”