ArF halftone PSM cleaning process optimization for next-generation lithography

Son, Yong-Seok; Jeong, Seong-Ho; Kim, Jeongbae; Kim, Hong-Seok

doi:10.1117/12.392044

Cited by 3 publications

(2 citation statements)

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“…A mixture of NH 4 OH in water partially dissociates into NH 4 + and OH -ions and this ionized solution increases the pH of the cleaning mix and attain suitable zeta potential values. However the OH-ions are also responsible for material loss [2,3], e.g. OH -attack on Si surface and form a negative SiO 2 (OH) 2 2-species.…”

Section: Introductionmentioning

confidence: 99%

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Effect of cleaning chemistry on MegaSonic damage

Singh¹,

Dietze²,

Dress

2013

SPIE Proceedings

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Acoustic energy applied through the cleaning media results into two kinds of cavitation effects; namely stable and transient cavitation. A uniformly pulsating bubble transforms into stable cavitation behavior whereas a bubble implosion implies transient cavitation. Pattern damage of sensitive features on advanced masks as well as Ru pitting on EUVL reticles is mostly the result of transient cavitation. Stable cavitation on the other hand produces a very narrowly controlled energy distribution which allows cleaning without damage. Stable cavitation can be achieved by suitably tailoring physical, chemical and thermodynamic properties of the liquid and gas media. In this paper we investigate a new cleaning chemistry that has favorable physical and thermodynamic properties to produce stable MegaSonic cavitation. The cavitation created in this chemistry is characterized by measuring acoustic energy as well as by pattern damage and particle removal efficiency on mask level. The chemical properties (pH & zeta potential) of this chemistry are compared with conventional cleaning chemistries. Its effects on CD shift as well as phase and transmission loss are also studied.

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Section: Introductionmentioning

confidence: 99%

“…However the OH-ions are also responsible for material loss [2,3], e.g. OH -attack on Si surface and form a negative SiO 2 (OH) 2 2-species. The positive counter ions NH 4 + can, due to their high mobility, diffuse onto the surface and interact with the Si-O bond of the negative species (figure 1).…”

Section: Introductionmentioning

confidence: 99%