2020
DOI: 10.1002/ppap.201900265
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Argon–water DBD pretreatment and vapor‐phase silanization of silica: Comparison with wet‐chemical processes

Abstract: A dielectric‐barrier discharge (DBD) in an argon–water mixture is applied to plasma pretreatment (PP) of amorphous silica for subsequent vapor‐phase silanization (VS) in the same reactor. Comparison of amino‐silanization of silica fiber‐optic biosensor probes using a PP/VS sequence with strategies involving wet‐chemical pretreatment or silanization shows a considerable improvement in reproducibility by the completely dry process. Practical applicability is demonstrated by an immunoassay with human immunoglobul… Show more

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Cited by 2 publications
(1 citation statement)
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“…Simultaneously, the temperature of the chamber was raised to 80 °C. [ 13,23 ] Then after, the temperature was maintained at 80 °C during the whole silanization process. Then the silanized chips were utilized for the further process without any washing steps involved.…”
Section: Methodsmentioning
confidence: 99%
“…Simultaneously, the temperature of the chamber was raised to 80 °C. [ 13,23 ] Then after, the temperature was maintained at 80 °C during the whole silanization process. Then the silanized chips were utilized for the further process without any washing steps involved.…”
Section: Methodsmentioning
confidence: 99%