Arrays of Cu²⁺-complexed organic clusters grown on gold nano dots

Abstract

Controlled growth of organic multilayers from periodic gold dot arrays on SiO 2 surfaces has been used to create complex overlayer structures. Nanosphere lithography (NSL) was first used to produce uniform metal patterns with particle sizes of 40 nm, spaced by gaps of 80 nm. These particles served as the nucleation centers for layer-by-layer growth of organic/metal ion complexes. The resulting structures can either be isolated adsorbed dot structures on a continuous surface or continuous networks of the adsorbed materials with isolated arrays of SiO 2 surface dots.Step-by-step organic multilayer growth from small isolated centers enables us to monitor each process step by direct surface imaging techniques. Further metal evaporation and lift-off of the organic layers creates star-shaped gold structures within the original array.

Using Date Seed Powder Nanoparticles and Infusion as a Sustainable Source of Nutraceuticals

“…However the smaller nanoparticles (60 nm and below) are more likely to be transported into cells through direct cellular uptake which help to increase bioactivity of encapsulated phenolic phytochemicals. [17] Two basic approaches are used for creating nanostructures -bottom-up [18] and top-down [19]. The bottom-up technique includes the use of atoms, molecules and nanoparticles as building blocks at a molecular scale.…”

Grafted Functional Polymer Nanostructures Patterned Bottom-Up by Colloidal Lithography and Initiated Chemical Vapor Deposition (iCVD)

“…Their 2-D patterns result from a line-of-site deposition of thin nanodots, which may coalesce to form a honeycomb pattern of thin lines. These structures have been used to pattern carbon nanotube growth, ZnO nanorods, nickel, and gold. , …”

Nanostructures using self-assembled multilayers as molecular rulers and etch resists

“…In these studies, the chemical patterns of SAMs were created by microcontact printing ͑CP͒. 4,14 Here, we complemented the two functionalities of selfassembled organic films as molecular-ruler resists and etch resists to pattern hierarchical nanostructures. Although it is possible to create nanostructures with dimensions as small as 50 nm using CP, features smaller than this have remained inaccessible due to the lateral diffusion of the molecules and the distortion of the elastomeric stamp used in the patterning step.…”