We investigate the switching kinetics of oxygen vacancies (Ov) diffusion in LPCMO-Ag memristive interfaces by performing experiments on the temperature dependence of the high resistance (HR) state under thermal cycling. Experimental results are well reproduced by numerical simulations based on thermally activated Ov diffusion processes and fundamental assumptions relying on a recent model proposed to explain bipolar resistive switching in manganite-based cells. The confident values obtained for activation energies and diffusion coefficient associated to Ov dynamics, constitute a validation test for both model predictions and Ov diffusion mechanisms in memristive interfaces.Memristive devices (ReRAM) based on oxides compounds are deserving a lot of attention in view of its potential use for next generation of non-volatile memories. Its operation relies in the resistive switching (RS) effect, which is the change in the resistance of the device between two different values, the high resistance state (HRS) and the low resistance state (LRS), by an appropriate electric stimulus. [1, 2] The transition from HRS to LRS is called a set, while the opposite process is defined as reset.A large variety of oxides has been explored for ReRAM applications, ranging from binary transition metal oxides [3-7] to complex ones -manganites and perovskites-like. [8][9][10][11][12][13][14] In complex oxides based devices the emerged consensus points to the voltage-driven ion migration toward/inward the metal-electrode interfaces, as the relevant mechanisms controlling bipolar RS, i.e the voltage polarity dependent switching mode. [2] In particular, oxygen vacancies (ions) have been proposed as the active agents participating in the bipolar RS effect. [15][16][17][18][19] Ref. 15 constitutes one of the first evidences supporting oxygen vacancies (Ov) diffusion in complex oxides based devices. By electric pulsing Pr 0.7 Ca 0.3 MnO 3 films deposited in an oxygen-deficient ambient, and analyzing the relaxation in time of the HR state, information on the activation energy for Ov diffusion has been obtained.In addition works searching for ReRAM performance improvement by introducing dopants, have been also reported consistently. As an example, the efficiency of Ov migration by Nb doping Ba 0.7 Sr 0.3 TiO 3 (BST) thin films, was tested in Ref. 20. As stated in that work, the defects distribution is strongly related to the RS properties, assisting the Ov migration and making more efficient the ReRAM operation.Although the exact microscopic origin behind the RS effect remains elusive, a recent phenomenological model, named voltage enhanced oxygen vacancy (VEOV) migration model, [21] succeeded in reproducing many non trivial characteristic of bipolar RS experiments carried in complex oxides, under different stimulus protocols. [12,13,22] The VEOV model incorporates as main ingredients (i) the drift/diffusion of Ov along the highly resistive metal/oxide interfaces, where strong electric fields developed and (ii) a linear relation between resistivit...