Atmospheric Chemistry of HFE-7500 [n-C3F7CF(OC2H5)CF(CF3)2]:  Reaction with OH Radicals and Cl Atoms and Atmospheric Fate of n-C3F7CF(OCHO•)CF(CF3)2 and n-C3F7CF(OCH2CH2O•)CF(CF3)2 Radicals

Goto, Masashi; Inoue, Yoriteru; Kawasaki, Masahiro; Guschin, A.; Molina, L. T.; Molina, M. J.; Wallington, Timothy J.; Hurley, M. D.

doi:10.1021/es0113798

Cited by 19 publications

(19 citation statements)

References 26 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Using this approaching we found a REs of 0.55 and 0.43 W m -2 ppbv -1 for the 0-2500 and 900-1900 cm -1 wavenumber intervals, respectively. The previous literature value measured for the 900-1900 cm -1 interval was reported by Goto et al (2002), and it is 16% lower than the predicted here, 0.37 vs 0.43. However, differences within 14-25% of existing experimental values provide a valuable data for the REs in order to calculate accurate GWPs values (Blowers et al, 2007;Bravo et al, 2010b).…”

Section: Strategies To Design Cfc Alternatives With Low Environmentalcontrasting

confidence: 78%

“…In units of W m -2 ppbv -1 f From Bravo et al (2010) g k(298K) = 7.3x10 -14 cm 3 molecule -1 s -1 (Bravo et al, 2010) h k(298K) = 1.5x10 -14 cm 3 molecule -1 s -1 (Bravo et al, 2010) i k(298K) = 1.5x10 -14 cm 3 molecule -1 s -1 (Bravo et al, 2010) j k(298K) = 2.6x10 -14 cm 3 molecule -1 s -1 (Goto et al, 2002) k From Goto et al (2002) …”

Section: Atmospheric Implicationsmentioning

confidence: 99%

See 1 more Smart Citation

Contribution of the Atmospheric Chlorine Reactions to the Degradation of Greenhouse Gases: CFCs Substitutes

Bravo¹,

Díaz-de-Mera²,

Aranda³

et al. 2011

Planet Earth 2011 - Global Warming Challenges and Opportunities for Policy and Practice

View full text Add to dashboard Cite

Section: Strategies To Design Cfc Alternatives With Low Environmentalcontrasting

confidence: 78%

Section: Atmospheric Implicationsmentioning

confidence: 99%

Contribution of the Atmospheric Chlorine Reactions to the Degradation of Greenhouse Gases: CFCs Substitutes

Bravo¹,

Díaz-de-Mera²,

Aranda³

et al. 2011

Planet Earth 2011 - Global Warming Challenges and Opportunities for Policy and Practice

View full text Add to dashboard Cite

“…To indicate that reactions competing for the OH radical make it difficult to consume significant amounts of a sample or reference in the older technique [8][9][10], (12) In mode 1, the OH radical concentration decreased rapidly from 2.78 × 10 11 to 3.47 × 10 10 radicals cm…”

Section: Simulation Of Oh Radical Formation Using a Chemical Modelmentioning

confidence: 99%

“…Photolytic sources include H 2 O 2 [3], HONO [4,5], CH 3 ONO-O 2 [6,7], and O 3 -H 2 O gas mixtures [8][9][10]. These sources typically produce OH radical concentrations of 10 7 -10 9 radicals cm −3 [11].…”

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

New technique for generating high concentrations of gaseous OH radicals in relative rate measurements

Chen

Kutsuna

Tokuhashi

et al. 2003

Int J of Chemical Kinetics

View full text Add to dashboard Cite

We have developed a technique for generating high concentrations of gaseous OH radicals in a reaction chamber. The technique, which involves the UV photolysis of O 3 in the presence of water vapor, was used in combination with the relative rate method to obtain rate constants for reactions of OH radicals with selected species. A key improvement of the technique is that an O 3 /O 2 (3%) gas mixture is continuously introduced into the reaction chamber, during the UV irradiation period. An important feature is that a high concentration of OH radicals [(0.53-1.2) × 10 11 radicals cm −3 ] can be produced during the irradiation in continuous, steady-state experiment. Using the new technique in conjunction with the relative rate method, we obtained the rate constant for the reaction of CHF 3 (HFC-23) with OH radicals, k 1 . We obtained k 1 (298 K) = (3.32 ± 0.20) × 10 −16 and determined the temperature dependence of k 1 to be (0.48 ± 0.13) × 10 −12 exp[−(2180 ± 100)/T] cm 3 molecule −1 s −1 at 253-328 K using CHF 2 CF 3 (HFC-125) and CHF 2 Cl (HCFC-22) as reference compounds in CHF 3 -reference-H 2 O gas mixtures. The value of k 1 obtained in this study is in agreement with previous measurements of k 1 . This result confirms that our technique for generating OH radicals is suitable for obtaining OH radical reaction rate constants of ∼10 −16 cm 3 molecule −1 s −1 , provided the rate constants do not depend on pressure. In addition, it also needed to examine whether the reactions of sample and reference compound with O 3 interfere the measurement when selecting this technique. C

show abstract

Fluoroethers and Fluoroamines

Costello

Flynn

Owens

2004

Kirk-Othmer Encyclopedia of Chemical Technology

View full text Add to dashboard Cite

Perfluoroaliphatic ethers and tertiary amines are members of a class of unreactive compounds known in the industry as inert fluids. These compounds are prepared by electrochemical fluorination, direct fluorination using elemental fluorine or cobalt trifluoride fluorination. They are nontoxic, nonflammable, have densities of 1.7–1.9 g/cm 3 , surface tensions of 9–19 dyn/cm and lower kinematic viscosities than hydrocarbons. Their thermal stabilities are comparable to the perfluoroalkanes. Their chemical properties are characterized by their extreme unreactivity. The lower molecular weight compounds are used in the electronics industry as heat‐transfer fluids and electronic testing fluids. The higher molecular weight polymers are used as hazardous duty vacuum pump oils, specialty greases, and lubricants. Hydrofluoroethers and hydrofluoropolyethers are new classes of highly fluorinated ethers having properties intermediate between the perfluoroethers and hydrocarbon ethers. They are low in toxicity, nonflammable, with densities of 1.4–1.7 g/cm 3 , surface tensions of 13–16 dyn/cm and low kinematic viscosity. The hydrofluoropolyethers are used as heat‐transfer fluids. The hydrofluoroethers are used as heat‐transfer fluids as well as precision cleaning solvents and solvents for specialty applications such as coating deposition.

show abstract

Atmospheric Chemistry of HFE-7500 [n-C₃F₇CF(OC₂H₅)CF(CF₃)₂]: Reaction with OH Radicals and Cl Atoms and Atmospheric Fate of n-C₃F₇CF(OCHO•)CF(CF₃)₂ and n-C₃F₇CF(OCH₂CH₂O•)CF(CF₃)₂ Radicals

Cited by 19 publications

References 26 publications

Contribution of the Atmospheric Chlorine Reactions to the Degradation of Greenhouse Gases: CFCs Substitutes

Contribution of the Atmospheric Chlorine Reactions to the Degradation of Greenhouse Gases: CFCs Substitutes

New technique for generating high concentrations of gaseous OH radicals in relative rate measurements

Fluoroethers and Fluoroamines

Contact Info

Product

Resources

About