2012
DOI: 10.1002/aenm.201200043
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Atmospheric‐Pressure Chemical Vapor Deposition of Iron Pyrite Thin Films

Abstract: Iron pyrite (cubic FeS 2 ) is a promising candidate absorber material for earth-abundant thin-fi lm solar cells. In this report, single-phase, large-grain, and uniform polycrystalline pyrite thin fi lms are fabricated on glass and molybdenum-coated glass substrates by atmospheric-pressure chemical vapor deposition (AP-CVD) using the reaction of iron(III) acetylacetonate and tert -butyl disulfi de in argon at 300 ° C, followed by sulfur annealing at 500-550 ° C to convert marcasite impurities to pyrite. The pyr… Show more

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Cited by 156 publications
(180 citation statements)
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“…An optical band gap of % 1.04 eV was found using optical absorption measurements,w hich is close to the reported values in the literature. [7] However, the films were found to be photo-inactive. Electrical measurements revealed the films to be too conducting to be used as ap hoton absorber.…”
Section: In Situ Iron Pyrite Synthesis and Film Forming By Spray Pyromentioning
confidence: 99%
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“…An optical band gap of % 1.04 eV was found using optical absorption measurements,w hich is close to the reported values in the literature. [7] However, the films were found to be photo-inactive. Electrical measurements revealed the films to be too conducting to be used as ap hoton absorber.…”
Section: In Situ Iron Pyrite Synthesis and Film Forming By Spray Pyromentioning
confidence: 99%
“…[7][8][9][10][11] Despitep ossessing such desirable properties,t he success in preparing aw orking solar cell from iron pyrite has been hampered by alack of control on the chemistry of the material and by crystald efects that are believed to be responsible for the low photovoltage output from pyrite solar cells.T he crystal defects manifest as specific material conditions that include Fe-S phase impurities (troilite, greigite,p yrrhotite,e tc. ), stoichiometric deviations, [12][13][14] intrinsic bulk and surface defects, [15][16][17][18] reduced surface energy band gaps, [19] Fermi-level pinning, [20] surface-state-induced band bendinga nd ionized deep donors, [9] and surface inversion layers.…”
mentioning
confidence: 99%
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“…Although various available techniques such as chemical vapor deposition, [ 9,10 ] atomic layer deposition, [ 11,12 ] molecular beam epitaxy, [ 13,14 ] electrodeposition, [ 7,15 ] successive ionic layer adsorption and reaction, [ 16,17 ] vapor sublimation, [ 18 ] etc., are able to produce thin fi lms of MS, they lack generality or need sophisticated instrumentation, and are complicated. In this context, chemical bath deposition is inarguably the simplest method for thin fi lm deposition.…”
mentioning
confidence: 99%
“…С использованием пленок p-FeS 2 изготавливают выпрямляющие ток гетероструктуры ZnO/p-FeS 2 [6] и создают омические контакты к p-CdTe в структурах n-CdS/p-CdTe/p-FeS 2 /Au [7]. При участии хлора в процес-сах выращивания пленок, который компенсирует дыроч-ный тип проводимости, получают n-FeS 2 [8]. Используя n-FeS 2 , изготавливают диоды Шоттки n-FeS 2 /M (M = Pt, Au, Nb) [9] и p−i−n-диоды ZnO/FeS 2 /CuI [10].…”
Section: Introductionunclassified