2013
DOI: 10.1016/j.surfcoat.2013.06.070
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Atmospheric pressure PECVD based on a linearly extended DC arc for adhesion promotion applications

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Cited by 7 publications
(10 citation statements)
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“…The remote gas feeding system for SiO2 deposition film is made from anodized AlMgSi1. A detailed description of the plasma source and the remote gas feeding system is given in [3]. The thin SiO2 films on titanium alloys presented in this article are deposited using a 150-mm-LARGE plasma source and hexamethyldisiloxane (HMDSO) as precursor.…”
Section: Plasma Treatmentmentioning
confidence: 99%
“…The remote gas feeding system for SiO2 deposition film is made from anodized AlMgSi1. A detailed description of the plasma source and the remote gas feeding system is given in [3]. The thin SiO2 films on titanium alloys presented in this article are deposited using a 150-mm-LARGE plasma source and hexamethyldisiloxane (HMDSO) as precursor.…”
Section: Plasma Treatmentmentioning
confidence: 99%
“…Currently wet chemical processes such as NaTESi, which are partially based on toxic and environmentally hazardous compounds, are used for the pre‐treatment of titanium. An alternative to these wet chemical methods is the deposition of silicone dioxide films using the LARGE plasma at AP when epoxy resin adhesives are used , …”
Section: Resultsmentioning
confidence: 99%
“…The developed plasma source (based on the LARGE) offers a scalable working width and operates with a range of plasma gases that flow perpendicular to the plasma axis. The basic principle of this technology is the same as to the conventional plasma (powder) spraying.…”
Section: Methodsmentioning
confidence: 99%
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