Atom beam sputtered Mo2C films as a diffusion barrier for copper metallization

Tripathi, C. C.; Kumar, Mukesh; Kumar, Dinesh

doi:10.1016/j.apsusc.2008.09.076

Cited by 23 publications

(26 citation statements)

References 27 publications

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“…The MoC intermediate layer performed two functions: promoting the epitaxial growth of the (001) textured FePt film and avoiding the Cr diffusion into the FePt layer. Molybdenumcarbide is a potential diffusion barrier because of its high melting point, high thermal expansion coefficient, and low bulk resistivity [11]. The MoC film with face centered cubic (fcc) structure shows lattice constant of 0.427 nm.…”

Section: Introductionmentioning

confidence: 99%

Magnetic properties and microstructure of FePt/MoC/CrRu films

Tsai

Luo

Chen

et al. 2015

Journal of Magnetism and Magnetic Materials

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Section: Introductionmentioning

confidence: 99%

Magnetic properties and microstructure of FePt/MoC/CrRu films

Tsai

Luo

Chen

et al. 2015

Journal of Magnetism and Magnetic Materials

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“…[17] Composition control has also been problematic in efforts to form molybdenum carbide by co-sputtering. [19,20] In these vaporphase techniques the resulting film composition is most likely controlled by the kinetics of Mo and C incorporation. In contrast, the use of oxide film growth in conjunction with the slow TPR process favors the formation of thermodynamically stable phases.…”

Section: Smentioning

confidence: 99%

“…[10][11][12][13][14][15][16] As a thin film, the high hardness and thermal stability of the transition metal carbides make them useful as wear-resistant materials. [17,18] More recent studies have focused on the optoelectronic properties of molybdenum carbide for a range of applications including mirrors, [19] diffusion barriers, [20] interconnects, [21] and electron field emission. [22] Our interest is in the creation of inexpensive alternatives to platinum group metals for surface dissociation of H 2 .…”

Section: Introductionmentioning

confidence: 99%

“…[23,25] Control of phase purity has been problematic for both CVD and PVD approaches, and films often contain a mixture of carbon-rich products that display a complex dependence on the specific operating conditions employed. [17,20,23] In contrast, for catalysis applications it is relatively straightforward to achieve the desired β-Mo 2 C phase in powder form. [10][11][12][13] The key development came from Boudart and coworkers [10,11] [14] used this strategy to form catalyst coatings through the carburization of pre-oxidized molybdenum sheets, and applied them to the water gas shift reaction.…”

Section: Introductionmentioning

confidence: 99%

“…Numerous techniques have been used to deposit molybdenum carbide films including chemical vapor deposition (CVD), [17,23] physical vapor deposition (PVD), [18,20] and electrodeposition. [24] The Mo-C system is quite complex, with numerous stable and metastable compounds and crystal phases that have been observed.…”

Section: Introductionmentioning

confidence: 99%

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Nanoporous, Metal Carbide, Surface Diffusion Membranes for High Temperature Hydrogen Separations

Way¹,

Wolden²

2013

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Colorado School of Mines (CSM) developed high temperature, hydrogen permeable membranes that contain no platinum group metals with the goal of separating hydrogen from gas mixtures representative of gasification of carbon feedstocks such as coal or biomass in order to meet DOE NETL 2015 hydrogen membrane performance targets. We employed a dual synthesis strategy centered on transition metal carbides. In the first approach, novel, high temperature, surface diffusion membranes based on nanoporous Mo 2 C were fabricated on ceramic supports. These were produced in a two step process that consisted of molybdenum oxide deposition followed by thermal carburization. Our best Mo 2 C surface diffusion membrane achieved a pure hydrogen flux of 367 SCFH/ft 2 at a feed pressure of only 20 psig. The highest H 2 /N 2 selectivity obtained with this approach was 4.9. A transport model using "dusty gas" theory was derived to describe the hydrogen transport in the Mo 2 C coated, surface diffusion membranes. The second class of membranes developed were dense metal foils of BCC metals such as vanadium coated with thin (< 60 nm) Mo 2 C catalyst layers. We have fabricated a Mo 2 C/V composite membrane that in pure gas testing delivered a H 2 flux of 238 SCFH/ft 2 at 600 °C and 100 psig, with no detectable He permeance. This exceeds the 2010 DOE Target flux. This flux is 2.8 times that of pure Pd at the same membrane thickness and test conditions and over 79% of the 2015 flux target. In mixed gas testing we achieved a permeate purity of ≥99.99%, satisfying the permeate purity milestone, but the hydrogen permeance was low, ~0.2 SCFH/ft 2 .psi. However, during testing of a Mo 2 C coated Pd alloy membrane with DOE 1 feed gas mixture a hydrogen permeance of >2 SCFH/ft 2 .psi was obtained which was stable during the entire test, meeting the permeance associated with the 2010 DOE target flux. Lastly, the Mo 2 C/V composite membranes were shown to be stable for at least 168 hours = one week, including cycling at high temperature and alternating He/H 2 exposure.4

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Atomic Layer Deposition of Molybdenum Carbide Thin Films

Kärkkäinen,

Popov,

Hatanpää

et al. 2024

Adv Materials Inter

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The development of deposition processes for metal carbide thin films is rapidly advancing, driven by their potential for applications including catalysis, batteries, and semiconductor devices. Within this landscape, atomic layer deposition (ALD) offers exceptional conformality, uniformity, and thickness control on spatially complex structures. This paper presents a comprehensive study on the thermal ALD of MoCx with MoCl5 and 1,4‐bis(trimethylgermyl)‐1,4‐dihydropyrazine [(Me3Ge)2DHP] as precursors, focusing on the functional properties and characterization of the films. The depositions are conducted at 200–300 °C and very smooth films with RMS Rq ≈0.3–0.6 nm on Si, TiN, and HfO2 substrates are obtained. The process has a high growth rate of 1.5 Å cycle−1 and the films appear to be continuous already after 5 cycles. The films are conductive even at thicknesses below 5 nm, and films above 18 nm exhibit superconductivity up to 4.4 K. In lieu of suitable references, Raman modes for molybdenum carbides and nitrides are calculated and X‐ray diffraction and X‐ray photoelectron spectroscopy are used for phase analysis.

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Atom beam sputtered Mo2C films as a diffusion barrier for copper metallization

Cited by 23 publications

References 27 publications

Magnetic properties and microstructure of FePt/MoC/CrRu films

Magnetic properties and microstructure of FePt/MoC/CrRu films

Nanoporous, Metal Carbide, Surface Diffusion Membranes for High Temperature Hydrogen Separations

Atomic Layer Deposition of Molybdenum Carbide Thin Films

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