Atom lithography of Fe

Sligte, te E Edwin; Smeets, Bart; Stam, van der Kmr; Herfst, RW Rudolf; Straten, van der Pjm; Beijerinck, Hcw Herman; Leeuwen, van Kah Ton

doi:10.1063/1.1818347

Cited by 41 publications

(23 citation statements)

References 15 publications

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“…The divergence is thus considerably larger than the best value obtained in our earlier experiments with transverse laser cooling of Fe [8] (α RMS = 0.17 m/s). However, the smallest obtained width of the deposited nanolines is equal to the width obtained with the laser collimated beam [6]. This is an indication that the divergence of the atomic beam is not (yet) the limiting factor for the obtained structured width.…”

Section: Methodsmentioning

confidence: 63%

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Atom lithography without laser cooling

et al. 2009

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Section: Methodsmentioning

confidence: 63%

“…This technique has been applied to Na [1], Cr [2,3], Al [4], Yb [5], and Fe [6,7]. Just as for the case of focusing light, a well collimated atomic beam is crucial for atom lithography.…”

Section: Introductionmentioning

confidence: 99%

Atom lithography without laser cooling

et al. 2009

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“…The principle of atom lithography is based on using a standing wave (SW) of light as a mask on atoms to concentrate the atomic flux periodically and create desired patterns at the nanometer scale (for recent reviews see, [1,2]). Since the first experimental demonstration of submicron atomic structures [3], the subject has seen a considerable growth both theoretically [4][5][6][7][8] and experimentally [9][10][11][12][13][14][15]. In the direct deposition setup, periodic atomic lines of sodium [3,9], chromium [10,11], aluminum [12], ytterbium [13], and iron [14] atoms have been successfully fabricated.…”

Section: Introductionmentioning

confidence: 99%

Atom lithography with near-resonant standing waves

2010

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We study the optimal focusing of two-level atoms with a near resonant standing wave light, using both classical and quantum treatments of the problem. Operation of the focusing setup is considered as a nonlinear spatial squeezing of atoms in the thin-and thick-lens regimes. It is found that the near-resonant standing wave focuses the atoms with a reduced background in comparison with fardetuned light fields. For some parameters, the quantum atomic distribution shows even better localization than the classical one. Spontaneous emission effects are included via the technique of quantum Monte Carlo wave function simulations. We investigate the extent to which non-adiabatic and spontaneous emission effects limit the achievable minimal size of the deposited structures.

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“…In this article we will discuss our experiments which are using neutral chromium atoms to write periodic nanometerscale structures by laser-focused atomic deposition (Timp et al, 1992;McClelland et al, 1993;Sligte et al, 2004;McGowan et al, 1995;Rehse et al, 2000;Fioretti et al, 2005). In these experiments atoms are focused to the desired pattern by the optical dipole force which results from intensity gradients in a light field.…”

Section: Introductionmentioning

confidence: 99%

Nanoscale Pitch Standards Sample Fabricated using Laser-Focused Atomic Deposition

Zhao

et al. 2011

American Journal of Nanotechnology

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Problem statement: Nanotechnology is already a large sector of industry and science research and it is expected to continue to grow at very fast rate. The determination of absolute measurements of length at the nanometer scale and below is very difficult and expensive. So the nanoscale metrology standard is needed. Approach: The laser-focused atomic deposition is a new way to establish nanoscale pitch standards. When the atoms pass though laser standing wave field, the atoms will change the moving trajectory and be focused to the node (or antinode) of the laser standing wave according to the detuning of laser frequency and atomic resonant frequency. Because of the period of the laser standing wave, laser mask will form the anologue of an array of cylindrical lense. If a substrate is positioned at the focal plane of this lens array, a periodic structure is depositing onto the surface. The period of this structure is λ/2 of laser. Results: In this letter, a 425 nm laser light standing wave is used to focus a beam of chromium atoms to fabricate the nanoscale pitch standards sample of 213±0.1 nm. The height was 4 nm. The (FWHM) width of 64±6 nm. Conclusion/Recommendations: The period of this structure is λ/2 of laser, whose spatial period can be traced directly to an atomic transtition frequency and the uncertainty possibility is 10, which is fitted to be as the nanopitch standards.

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Atom lithography of Fe

Cited by 41 publications

References 15 publications

Atom lithography without laser cooling

Atom lithography without laser cooling

Atom lithography with near-resonant standing waves

Nanoscale Pitch Standards Sample Fabricated using Laser-Focused Atomic Deposition

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