The importance of antiphase domain boundaries for epitaxial multilayer growth during ultrahigh vacuum chemical vapor deposition of Si on Si(100)-(2 × 1) from SiH 4 and SiH 2 Cl 2 at intermediate temperatures is illustrated. Under these conditions multilayer growth is governed by heterogeneous nucleation of dimer strings at antiphase domain boundaries of the underlying layer which represent deep potential minima for diffusing species. This is in contrast to the formation of the first epitaxial layer, which nucleates homogeneously on the flat substrate terraces.If silicon chemical vapor deposition (CVD) on Si(100)-(2 × 1) is carried out in an intermediate temperature and pressure regime, epitaxy proceeds by island nucleation and growth [1,2]. The evolution of the surface topography in this intermediate regime depends on the extent of interlayer transport. If interlayer transport is very unfavorable, the roughness increases with deposition time [3]. In the case of perfect layer-by-layer growth each layer is completely filled by deposited adatoms before nucleation of the next layer starts and the surface roughness is oscillating with maximum amplitude [3]. Experimentally, intermediate behavior is frequently observed during growth under MBE as well as under CVD conditions, where interlayer transport is possible to a certain extent. This results in nucleation of new layers before the underlying layers are completely filled [1,2,4]. Under these conditions reflectance high-energy electron diffraction (RHEED) intensity oscillations of reduced amplitude can be observed if the rate of interlayer transport is sufficiently high.For a more detailed picture of the atomic-scale growth process and the resulting mesoscopic structures it is necessary to follow these processes on a microscopic scale. Scanning tunneling microscopy (STM) studies have shown that island nucleation in SiH 4 -based ultrahigh vacuum CVD (UHV-CVD) on Si(100)-(2 × 1) depends very sensitively on