2011
DOI: 10.1016/j.elecom.2010.11.008
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Atomic emission spectroelectrochemical investigation of the anodization of AA7050T74 aluminum alloy

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Cited by 14 publications
(8 citation statements)
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“…This interaction enhances the rate of diffusion of metal ions from the metal/film interface to the film/solution interface, leading to the formation of cation vacancies, which lead in turn to breakdown of the passive film. [60,61] Figures 17(a) and (b) show XRD data of alloy IV treated at 0.10 and +0.420 V vs SCE (at breakdown potential of oxide layer). The data of the oxide film formed on the alloy surface at the two potentials are compared.…”
Section: Eis Measurementsmentioning
confidence: 98%
“…This interaction enhances the rate of diffusion of metal ions from the metal/film interface to the film/solution interface, leading to the formation of cation vacancies, which lead in turn to breakdown of the passive film. [60,61] Figures 17(a) and (b) show XRD data of alloy IV treated at 0.10 and +0.420 V vs SCE (at breakdown potential of oxide layer). The data of the oxide film formed on the alloy surface at the two potentials are compared.…”
Section: Eis Measurementsmentioning
confidence: 98%
“…In order to do this, an in situ methodology is required, as methods to date involve analysis ex situ of the pretreatment electrolyte, and analysis subsequent to the pretreatment process. The aim of the present work is to demonstrate the utility of atomic emission spectroelectrochemistry (AESEC) to monitor the kinetics of Al alloy surface pretreatment (which is possible at open circuit using AESEC) in terms of alloy dissolution, residual film formation, and particle release.35 AESEC analysis of surface treatment processes have been previously performed in the context of chromating, phosphating, degreasing or anodization; [36][37][38][39][40] however the works to date have involved only single step treatments and comparatively low dissolution rates. The novelty of the work herein as concerning AESEC is to combine two different steps with respect to electrolyte exposure, and to analyze a system experiencing significantly rapid dissolution rates.…”
mentioning
confidence: 99%
“…1,2 Anodization is a convenient and important method of oxide film formation owing to low cost, flexibility and easiness. [3][4][5][6][7] There are several anodization processes that are currently used: conventional anodic oxidation (potentiostatic or galvanostatic) and plasma electrolytic oxidation (PEO). [3][4][5]7 The conventional anodization is well studied and allows growing oxide films of controlled thickness and quality.…”
mentioning
confidence: 99%
“…[3][4][5]7 The conventional anodization is well studied and allows growing oxide films of controlled thickness and quality. 5,7 The films can be partially hydrated. 5 The other method, PEO, which utilizes potentials above the breakdown voltage of the oxide film growing on the anode surface, makes possible to prepare well adherent, hard, ceramic-like coatings.…”
mentioning
confidence: 99%
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