Atomic force microscopy analysis of surface topography of pure thin aluminum films

Mwema, Fredrick Madaraka; Oladijo, Oluseyi Philip; Sathiaraj, T.S.; Akinlabi, Esther Titilayo

doi:10.1088/2053-1591/aabe1b

Cited by 59 publications

(32 citation statements)

References 41 publications

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“…The details of sputtering and AFM used in the present work were presented in an earlier work [18]. Prior to sputtering, the four substrate types have been ground with SiC papers of #320, #500, #800, #1200 and then finely polished by diamond pastes up to 1 μm and mirror appearance and cleaned in ultrasonic bath in ethanol for 3 minutes.…”

Section: Experiments and Methodsmentioning

confidence: 99%

“…For each surface, five AFM images of sizes 256 × 256 pixels and scan areas of 3 × 3 μm 2 have been obtained and taken through Nanoscope V530r3sr3 software for computation of interface width, average roughness, skewness and coefficient of kurtosis according to the methods described in earlier publications [18,19]. The average roughness (Ra) is determined as…”

Section: Experiments and Methodsmentioning

confidence: 99%

“…Fractal analyses have been undertaken by height-toheight (H(r)), power spectral density (PSDF) functions and two-dimensional Minkowski measurements. The H(r) computation was based on the equations presented by Yadav et al [13], [14] whereas the PSDFs have been determined using the method presented by [11,18] in MATLAB®. The H(r) formula for an image area of m × m can be written as…”

Section: Experiments and Methodsmentioning

confidence: 99%

“…The largest maximum peak height is observed on films on Ti6Al4V substrates while the smallest is computed for stainless steel substrate. The maximum pit depth measures the difference between the highest peaks and lowest point of the film and very large value may mean presence of exposed surfaces of the substrate [18]. Positive low values of skewness observed indicate slight domination of peaks on the surface whereas negative indicate that the surfaces are dominated by valleys [23,19].…”

Section: Topographic Observationsmentioning

confidence: 99%

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Effect of Substrate Type on the Fractal Characteristics of AFM Images of Sputtered Aluminium Thin Films

Mwema

Akinlabi

Oladijo

2019

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The roughness features of aluminum thin films deposited by radio-frequency magnetron sputtering on Ti6Al4V, stainless steel, mild steel and commercially pure titanium substrates are studied via atomic force microscopy. The average roughness, interface width, skewness, kurtosis, roughness exponent, equivalent roughness, lateral correlation length, fractal dimension and Minkowski functionals have been computed for each sample. It is shown that both topology and fractal characteristics of the Al thin films are greatly influenced by the type of metallic substrate on which it is sputtered. The fractal studies reveal that the fractal dimensions range between 2 and 3, indicating that all the surfaces are self-affine. The Minkowski functionals show that the valleys and plateaus for all the surfaces are highly disconnected since very small positive values of Euler-Poincaré are computed. The differences in roughness characteristics are superficial indication that substrate types affect the nucleation and growth of surface features such as grain sizes and particles during sputtering.

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Section: Experiments and Methodsmentioning

confidence: 99%

Section: Experiments and Methodsmentioning

confidence: 99%

Section: Experiments and Methodsmentioning

confidence: 99%

Section: Topographic Observationsmentioning

confidence: 99%

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Effect of Substrate Type on the Fractal Characteristics of AFM Images of Sputtered Aluminium Thin Films

Mwema

Akinlabi

Oladijo

2019

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“…The high value of roughness (RMS) and skewness (Rsk) of the active layer with the thickness of 80 nm compared to 20 nm or other thickness (see Figure S3 (Supporting Information) for 40 and 60 nm) are resulted from the higher density of grains. [43,44] Moreover, Figure 4c,d shows the 2D fast Fourier transform (2D-FFT) of the corresponding AFM images depicting the symmetry of the respective surface morphologies. [45,46] The EQE spectra (Figure 5a) are similar for all the OPD devices with different thicknesses of the active layer.…”

Section: Introductionmentioning

confidence: 99%

Vacuum‐Processed Small Molecule Organic Photodetectors with Low Dark Current Density and Strong Response to Near‐Infrared Wavelength

Lee

Estrada

et al. 2020

Advanced Optical Materials

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A near‐infrared photodetector with optimized performance is reported using varied thickness (20, 40, 60, and 80 nm) of the active layer comprising chloroaluminium phthalocyanine (ClAlPc) and fullerene (C70) at the ratio of 1:3, and TAPC:10% MoO3 and BPhen as electron and hole blocking layers, respectively. The experimental results reveal that the photodetector with 80 nm thick active layer provides the best performance at the wavelength of 730 nm achieving a very low dark current density of 1.15 × 10−9 A cm−2 and an external quantum efficiency of 74.6% with a responsivity of 0.439 A W−1 at −2 V bias. Additionally, the device exhibits a dramatic high detectivity of 4.14 × 1013 cm Hz1/2 W−1 at 0 V bias. The device exhibits not only a large linear response over a wide optical power range (LDR of 173.0 dB), but also a broad frequency response (778.7 kHz) and rise/fall time of 2.13/0.77 µs (based on trigger pulses at a frequency of 10 kHz) at the applied bias of −2 V. Based on the impedance spectroscopic study and the conventional characterization of electro‐optical properties, the results demonstrate the superiority of this device over other small molecule‐based near‐infrared photodetectors.

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The Use of Power Spectrum Density for Surface Characterization of Thin Films

Mwema

Akinlabi

Oladijo

2019

Photoenergy and Thin Film Materials

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Atomic force microscopy analysis of surface topography of pure thin aluminum films

Cited by 59 publications

References 41 publications

Effect of Substrate Type on the Fractal Characteristics of AFM Images of Sputtered Aluminium Thin Films

Effect of Substrate Type on the Fractal Characteristics of AFM Images of Sputtered Aluminium Thin Films

Vacuum‐Processed Small Molecule Organic Photodetectors with Low Dark Current Density and Strong Response to Near‐Infrared Wavelength

The Use of Power Spectrum Density for Surface Characterization of Thin Films

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