Atomic Interfacial Mixing to Create Water Insensitive Adhesion

Yasuda, H.; Sharma, Ashok K.; Hale, Edward B.; James, William Joseph

doi:10.1080/00218468208073191

Cited by 36 publications

(19 citation statements)

References 8 publications

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“…The reason for good adhesion in the former case is felt to be chemical bonding between the silicon atoms of the plasma polymer and those of the glass via formation of Si-O-Si linkages. This oxide-type of interfacial bonding has been confirmed by XPS and AES [120,145]. This oxide-type of interfacial bonding has been confirmed by XPS and AES [120,145].…”

Section: Adhesionmentioning

confidence: 63%

“…Adhesion of PP organosilicon and organotin films to other substrate materials such as glass [143] and various metals [120, [143][144][145] has also been reported. PP tetramethyldisiloxane displays excellent adhesion to glass, but it adheres poorly to platinum [143].…”

Section: Adhesionmentioning

confidence: 99%

“…PP tetramethyldisiloxane displays excellent adhesion to glass, but it adheres poorly to platinum [143]. Similarly, in the case of organotin plasma polymer deposits on aluminum, the formation of Sn-O-Al bonding between film and substrate is thought to be responsible for the observed strong adhesion [120,144,145]. Similarly, in the case of organotin plasma polymer deposits on aluminum, the formation of Sn-O-Al bonding between film and substrate is thought to be responsible for the observed strong adhesion [120,144,145].…”

Section: Adhesionmentioning

confidence: 99%

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Plasma-Polymerized Organosilicones and Organometallics

Wróbel

1990

Plasma Deposition, Treatment, and Etching of Polymers

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Section: Adhesionmentioning

confidence: 63%

Section: Adhesionmentioning

confidence: 99%

Section: Adhesionmentioning

confidence: 99%

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Plasma-Polymerized Organosilicones and Organometallics

Wróbel

1990

Plasma Deposition, Treatment, and Etching of Polymers

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“…Additionally, secondary contamination is expected to be greatly reduced compared to abrasion techniques. On polymeric surfaces, plasma treatment involves the interaction of free radicals and ions with the treated specimen [5,6]. This allows the surface chemistry and morphology of polymeric materials to be modified depending on the specific gas and conditions used for treatment [7].…”

Section: Introductionmentioning

confidence: 99%

The Effect of Atmospheric Plasma Treatment on the Chemistry, Morphology and Resultant Bonding Behavior of a Pan-Based Carbon Fiber-Reinforced Epoxy Composite

Zaldivar

Nokes

Steckel

et al. 2009

Journal of Composite Materials

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A study was undertaken to evaluate the effect of atmospheric plasma treatments on the surface chemistry, morphology, and mechanical properties of graphite/epoxy composites. Characterization included contact angle measurements, XPS, FTIR, SEM and AFM. Treatment was shown to increase strength by as much as 50% relative to untreated specimens. The improvement was related to the number of passes and can be attributed to chemical surface modifications. While the total amount of oxygen on the surface stabilized quickly after a few plasma passes, the concentration of the carboxyl groups was shown to continuously increase, and correlated well with observed increases in strength.

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“…As additional kinetic energy is provided to the film forming species, large changes can be affected in surface reaction rates, nucleation and growth kinetics, elemental sticking probabilities (7)(8)(9)(10)(11), as well as interdiffusion at the interface (12)(13)(14). As additional kinetic energy is provided to the film forming species, large changes can be affected in surface reaction rates, nucleation and growth kinetics, elemental sticking probabilities (7)(8)(9)(10)(11), as well as interdiffusion at the interface (12)(13)(14).…”

Section: Acknowledgmentmentioning

confidence: 99%

Ion‐Beam‐Assisted Deposition of Thin Carbonaceous Films: III . Barrier Properties

Taylor¹,

Cahen²,

Stoner³

1989

J. Electrochem. Soc.

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Interfacial mixing and improved adhesion have been proposed advantages of ion-beam-assisted film deposition (IBAD) techniques, however, very little information is available on the barrier properties of these films. This study has employed electrochemical impedance and open-circuit potential measurements to examine the barrier characteristics of such films. Thin (ca. 150A) films were formed on steel by impacting a 30 keV ion beam of either H, He, Ne, C2F6, or C2H6 into butadiene gas held in front of the substrate. These films were comPared to thin (3 ~m) films of conventional coatings: Epon 828, Epon 815, polyurethane} and vinyl XYHL. IBAD films appear to be limited by pinhole defects possibly associated with inclusions and precipitates at the substrate surface. The changes in the impedance spectra of ion-beam-assisted films show a correlation to the efficiency of energy transfer from the ion beam to the film species. This in turn has been correlated with interfacial mixing and adhesion characteristics. ) unless CC License in place (see abstract). ecsdl.org/site/terms_use address. Redistribution subject to ECS terms of use (see 142.104.240.194 Downloaded on 2015-06-04 to IP

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Atomic Interfacial Mixing to Create Water Insensitive Adhesion

Cited by 36 publications

References 8 publications

Plasma-Polymerized Organosilicones and Organometallics

Plasma-Polymerized Organosilicones and Organometallics

The Effect of Atmospheric Plasma Treatment on the Chemistry, Morphology and Resultant Bonding Behavior of a Pan-Based Carbon Fiber-Reinforced Epoxy Composite

Ion‐Beam‐Assisted Deposition of Thin Carbonaceous Films: III . Barrier Properties

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