2018
DOI: 10.1088/1361-6528/aab0fb
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Atomic layer deposited high-k dielectric on graphene by functionalization through atmospheric plasma treatment

Abstract: Atomic layer-deposited (ALD) dielectric films on graphene usually show noncontinuous and rough morphology owing to the inert surface of graphene. Here, we demonstrate the deposition of thin and uniform ALD ZrO films with no seed layer on chemical vapor-deposited graphene functionalized by atmospheric oxygen plasma treatment. Transmission electron microscopy showed that the ALD ZrO films were highly crystalline, despite a low ALD temperature of 150 °C. The ALD ZrO film served as an effective passivation layer f… Show more

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Cited by 8 publications
(11 citation statements)
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“…To facilitate electron transfer by increasing catalytic activity and redox reactivity, the attachment of functional groups onto CFs can be one of solutions. Plasma treatment is a popular method to attach the proper functional groups to CFs uniformly 16,17 . Besides that, this plasma treatment is clean, solvent‐free, time saving, and environmentally friendly method 32‐34 .…”
Section: Resultsmentioning
confidence: 99%
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“…To facilitate electron transfer by increasing catalytic activity and redox reactivity, the attachment of functional groups onto CFs can be one of solutions. Plasma treatment is a popular method to attach the proper functional groups to CFs uniformly 16,17 . Besides that, this plasma treatment is clean, solvent‐free, time saving, and environmentally friendly method 32‐34 .…”
Section: Resultsmentioning
confidence: 99%
“…Plasma treatment is a popular method to attach the proper functional groups to CFs uniformly. 16,17 Besides that, this plasma treatment is clean, solvent-free, time saving, and environmentally friendly method. [32][33][34] Of them, N 2 and O 2 plasmas are mostly famous and enable the proper surface modification of CFs.…”
Section: Electrochemical Evaluation Of the Effects Of N 2 And O 2 Plasma-treated Cfs On The Redox Reactivity Of Tironamentioning
confidence: 99%
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