Atomic layer deposition for membrane modification, functionalization and preparation: A review

Xiong, Sen; Qian, Xuefeng; Zhong, Zhaoxiang; Wang, Yong

doi:10.1016/j.memsci.2022.120740

Cited by 48 publications

(28 citation statements)

References 149 publications

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“…ALD is suitable for ultra-thin film deposition possibly down to the atomic level. Nowadays ALD is frequently employed in microelectronics fabrication for the deposition of high-κ gate oxides, ferroelectrics, metals, and nitrides [ 87 ].…”

Section: Fabrication Techniquesmentioning

confidence: 99%

A Review on Low-Dimensional Nanomaterials: Nanofabrication, Characterization and Applications

et al. 2022

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The development of modern cutting-edge technology relies heavily on the huge success and advancement of nanotechnology, in which nanomaterials and nanostructures provide the indispensable material cornerstone. Owing to their nanoscale dimensions with possible quantum limit, nanomaterials and nanostructures possess a high surface-to-volume ratio, rich surface/interface effects, and distinct physical and chemical properties compared with their bulk counterparts, leading to the remarkably expanded horizons of their applications. Depending on their degree of spatial quantization, low-dimensional nanomaterials are generally categorized into nanoparticles (0D); nanorods, nanowires, and nanobelts (1D); and atomically thin layered materials (2D). This review article provides a comprehensive guide to low-dimensional nanomaterials and nanostructures. It begins with the classification of nanomaterials, followed by an inclusive account of nanofabrication and characterization. Both top-down and bottom-up fabrication approaches are discussed in detail. Next, various significant applications of low-dimensional nanomaterials are discussed, such as photonics, sensors, catalysis, energy storage, diverse coatings, and various bioapplications. This article would serve as a quick and facile guide for scientists and engineers working in the field of nanotechnology and nanomaterials.

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Section: Fabrication Techniquesmentioning

confidence: 99%

A Review on Low-Dimensional Nanomaterials: Nanofabrication, Characterization and Applications

et al. 2022

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“…Atomic layer deposition (ALD) is a thin film deposition technique characterized by sequential self‐terminating reactions between precursor molecules and finite reactive sites on solid substrates 1 . With the capability of growing uniform and conformal films in three‐dimensional structures with complex shapes or with a large aspect ratio, 2 ALD has emerged as a promising technique in membrane fabrication 3,4 . ALD can improve the performance of pressure‐driven membranes via precise tailoring of the membrane microstructure as well as the incorporation of functional coating layers into the membrane channels, offering a desired pore size reduction, 5 surface functionalization, 6 or even mechanical properties enhancement 7 .…”

Section: Introductionmentioning

confidence: 99%

“…1 With the capability of growing uniform and conformal films in three-dimensional structures with complex shapes or with a large aspect ratio, 2 ALD has emerged as a promising technique in membrane fabrication. 3,4 ALD can improve the performance of pressure-driven membranes via precise tailoring of the membrane microstructure as well as the incorporation of functional coating layers into the membrane channels, offering a desired pore size reduction, 5 surface functionalization, 6 or even mechanical properties enhancement. 7 The pioneering work on ALD-based membrane fabrication was reported in 1995.…”

Section: Introductionmentioning

confidence: 99%

Modeling of deposit formation in mesoporous substrates via atomic layer deposition: Insights from pore‐scale simulation

Lee

Corkery

et al. 2022

AIChE Journal

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Atomic layer deposition (ALD) has been a promising technique in fabricating membranes and tuning their properties with a precision at the atomic level. Fabrication of zeolitic imidazolate framework (ZIF) membranes using the ligand-induced permselectivation (LIPS) method starts with the formation of an oxide in a mesoporous substrate by ALD and is followed by the transformation of this oxide to ZIF using imidazolate vapor treatment. The objective of the ALD step is to block the mesopores with a thin deposit, that is, one with small penetration depth and small thickness on the top surface of the substrate. Unlike typical ALD on nonporous substrates, where all available sites react per ALD cycle, thin deposit formation in a mesoporous substrate requires that only a small fraction of the available deposition sites (i.e., close to the substrate surface) is subjected to ALD. Consequently, reactant dosing and duration of pulses are important process variables which, together with diffusion and reaction kinetics determine the deposit structure. Quantitative understanding of the interplay of these variables and phenomena can enable the rational design of ALD within mesoporous substrates. Here, we extend our earlier modeling effort considering the coexistence of ALD both inside the pores and on the external surface of the substrate. Finite-volume based models were developed and validated to simulate the two distinct modes of deposition cycle by cycle. The total mass uptake of the substrate with ALD cycles can be predicted using the combined surface deposition and pore reaction-diffusion models as affirmed by in situ quartz crystal microbalance experimental data. The ALD reactor model combined with the deposition model can accurately capture the number of ALD cycles needed to block the pores of the substrate. Based on the model, we designed a modified ALD process and examined the performance of the corresponding LIPS membranes. The present modeling work provides a new understanding of the deposit formation via ALD within mesoporous substrates for a variety of membrane applications.Hao Gu, Dennis T. Lee, and Peter Corkery equally contributed to this study.

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“…Moreover, anodic nanoporous oxides have high chemical and thermal stability, and good biocompatibility, which can be further improved by surface functionalization techniques [ 10 ]. Among the various possibilities, atomic layer deposition (ALD) stands out for its ability to deposit compliant coatings on 3D nanostructured substrates, with outstanding thickness and uniformity control [ 11 ]. Various biocompatible materials, such as silicon dioxide (SiO 2 ) or titanium dioxide (TiO 2 ), can be easily deposited by this technique to a thickness of a few nanometers [ 12 ].…”

Section: Introductionmentioning

confidence: 99%

Nanoporous Membranes for the Filtration of Proteins from Biological Fluids: Biocompatibility Tests on Cell Cultures and Suggested Applications for the Treatment of Alzheimer’s Disease

Schreiner

Tamba

Mihai

et al. 2022

JCM

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Background: Alzheimer’s disease has a significant epidemiological and socioeconomic impact, and, unfortunately, the extensive research focused on potential curative therapies has not yet proven to be successful. However, in recent years, important steps have been made in the development and functionalization of nanoporous alumina membranes, which might be of great interest for medical use, including the treatment of neurodegenerative diseases. In this context, the aim of this article is to present the synthesis and biocompatibility testing of a special filtrating nano-membrane, which is planned to be used in an experimental device for Alzheimer’s disease treatment. Methods: Firstly, the alumina nanoporous membrane was synthesized via the two-step anodizing process in oxalic acid-based electrolytes and functionalized via the atomic layer deposition technique. Subsequently, quality control tests (spectrophotometry and potential measurements), toxicity, and biocompatibility tests (cell viability assays) were conducted. Results: The proposed alumina nanoporous membrane proved to be efficient for amyloid-beta filtration according to the permeability studies conducted for 72 h. The proposed membrane has proven to be fully compatible with the tested cell cultures. Conclusions: The proposed alumina nanoporous membrane model is safe and could be incorporated into implantable devices for further in vivo experiments and might be an efficient therapeutic approach for Alzheimer’s disease.

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Atomic layer deposition for membrane modification, functionalization and preparation: A review

Cited by 48 publications

References 149 publications

A Review on Low-Dimensional Nanomaterials: Nanofabrication, Characterization and Applications

A Review on Low-Dimensional Nanomaterials: Nanofabrication, Characterization and Applications

Modeling of deposit formation in mesoporous substrates via atomic layer deposition: Insights from pore‐scale simulation

Nanoporous Membranes for the Filtration of Proteins from Biological Fluids: Biocompatibility Tests on Cell Cultures and Suggested Applications for the Treatment of Alzheimer’s Disease

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