2015
DOI: 10.1021/acs.chemmater.5b02199
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Atomic Layer Deposition of Lithium Phosphorus Oxynitride

Abstract: An atomic layer deposition (ALD) process is successfully developed for fabricating high-quality lithium phosphorus oxynitride (LiPON) thin films for a potential use as a conformal solid-state electrolyte coating in 3D Li-ion microbattery technology. In our ALD process the challenge of simultaneously incorporating phosphorus and nitrogen in the films is overcome by using a novel nitrogen-containing phosphorus precursor, diethyl phosphoramidate, together with lithium hexamethyldisilazide as the lithium precursor… Show more

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Cited by 113 publications
(159 citation statements)
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“…Recently, the deposition of LiPON was achieved both by thermal and plasma-enhanced ALD [108,109,130]. In the PEALD process, LiO t Bu was used as the lithium source combined with a pulsing sequence of water, TMPO and nitrogen plasma [109].…”
Section: Methodsmentioning
confidence: 99%
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“…Recently, the deposition of LiPON was achieved both by thermal and plasma-enhanced ALD [108,109,130]. In the PEALD process, LiO t Bu was used as the lithium source combined with a pulsing sequence of water, TMPO and nitrogen plasma [109].…”
Section: Methodsmentioning
confidence: 99%
“…By using nitrogen plasma after the TMPO pulse, nitrogen could be incorporated into the films, causing the amorphization of the crystalline Li 3 PO 4 . In the thermal ALD process, the problems of nitrogen incorporation and nitrogen-phosphorous bond formation were resolved by using diethyl phosphoramidate, DEPA, a phosphate precursor with an amine group (Figure 9) [108]. By using DEPA with LiO t Bu, nitrogen contents as high as 9.7 at.% were achieved.…”
Section: Methodsmentioning
confidence: 99%
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“…Crystalline Li 3 PO 4 on the other hand only provides a conductivity of 10 -18 S/cm. Recently, ALD depositions of both Li 3 PO 4 and LiPON have been reported in literature (6)(7)(8)(9).…”
Section: Introductionmentioning
confidence: 99%