“…Nowadays, ALD is widely used in the industry for the deposition of metal and metal nitride films (Al, Ti, AlN, TiN) and the deposition of dielectric thin films (HfO 2 , ZrO 2 , and Al 2 O 3 ) [32][33][34][35][36]. The coatings deposited by ALD provide new applications in diverse areas of corrosion [37] because a thin ALD film serves as an efficient barrier protection against gases [38,39] and liquids [36,40]. Up to now, the most frequently used ALD corrosion protection coating has been Al 2 O 3 , which is usually deposited from trimethyl aluminium (Al(CH) 3 ) and water [39,[41][42][43][44] at temperatures ranging from 33 to 500 • C [37,[45][46][47].…”