2019
DOI: 10.1557/jmr.2019.338
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Atomic layer deposition of zirconium oxide thin films

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Cited by 29 publications
(12 citation statements)
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“…With increasing coverage the response of the system should transition from rather flexible to very rigid at a cover layer thickness that corresponds to the height of the molecules on the surface. The thickness of one ALD cycle is about 1 Å, 22,23 while the height of the molecule is E9 Å, as estimated from a published crystal structure of a similar complex. 24 Thus, we expect the transition to happen with 10 ALD cycles, and furthermore, that the transition will be relatively abrupt.…”
Section: Introductionmentioning
confidence: 92%
“…With increasing coverage the response of the system should transition from rather flexible to very rigid at a cover layer thickness that corresponds to the height of the molecules on the surface. The thickness of one ALD cycle is about 1 Å, 22,23 while the height of the molecule is E9 Å, as estimated from a published crystal structure of a similar complex. 24 Thus, we expect the transition to happen with 10 ALD cycles, and furthermore, that the transition will be relatively abrupt.…”
Section: Introductionmentioning
confidence: 92%
“…We controlled the MLD cycles to achieve a desirable film thickness. We measured the growth of these MLD processes using an in situ QCM [24,25]. To establish a repeatable uniform starting surface, we predeposited an Al 2 O 3 surface on the QCM crystals using ALD (inset of ), prior to performing the QCM measurements of the three MLD processes.…”
Section: Resultsmentioning
confidence: 99%
“…In the ALD experiments, we utilized a commercial ALD reactor (Savannah 200, Cambridge Nanotech Inc., Cambridge, MA). 16,17,31 LZO films were prepared by combining two individual sub-ALD processes of LiOH and ZrO 2 . The LiOH sub-cycle consisted of two alternative doses, LTB (98%, Strem Chemicals, Inc., USA) and deionized H 2 O. ZrO 2 ALD was performed with two alternative doses, tetrakis(dimethylamido)zirconium(IV) (TDMA-Zr) and deionized H 2 O.…”
Section: Ald-lzosmentioning
confidence: 99%
“…Previously, we have studied ALD-ZrO 2 . 31 In this study, we again measured ALD ZrO 2 using the timing sequence of 0.03 s TDMA-Zr -60 s purge -0.015 s H 2 O -60 s purge at 225 °C. As shown in Fig.…”
Section: In Situ Qcm Measurements Of Ald Lioh and Zromentioning
confidence: 99%
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