2000
DOI: 10.1002/1521-3951(200004)218:2<417::aid-pssb417>3.0.co;2-q
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Atomic Structure Based Simulation of X-Ray Scattering from Strained Superlattices

Abstract: The X‐ray scattering from strained superlattices is simulated using the positions of all individual atoms, determined by minimizing the strain energy of the structure, and the kinematic approximation (atomistic kinematic theory, AKT). For thin epilayers the agreement with dynamical diffraction theory (DT) is very close in the vicinity of a reciprocal lattice point, even in the case of large strain. Serious flaws in two of the five tested, widely used commercial DT simulation programs are revealed. DT in the tw… Show more

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Cited by 9 publications
(9 citation statements)
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“…where k o,h are the wavevectors of the incident and diffracted beams, h is the reciprocal lattice vector of the specific reflection, and n is the surface unit vector. Most x-ray simulation programs (for an overview of the faults of commercially available programs, see [8]) rely on a first-order approximation for α [6,9,16,17] namely…”
Section: Theoretical Considerationsmentioning
confidence: 99%
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“…where k o,h are the wavevectors of the incident and diffracted beams, h is the reciprocal lattice vector of the specific reflection, and n is the surface unit vector. Most x-ray simulation programs (for an overview of the faults of commercially available programs, see [8]) rely on a first-order approximation for α [6,9,16,17] namely…”
Section: Theoretical Considerationsmentioning
confidence: 99%
“…Expressions (2)-( 4) are reasonable approximations for an angular range of at most 0.2˚around the substrate reflection. Several researchers have recognized this deficiency and have resorted to either improved, dynamically corrected incidence parameters [6], (see footnote 2) purely kinematical models [8], or to second-order expansions [10,11]. Here, we do not resort to any approximations but use the kinematically exact expressions.…”
Section: Theoretical Considerationsmentioning
confidence: 99%
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“…Simulations of the XRD curves, to reconstruct the depth-distribution of strain in the materials, were done using a web-based code provided by the Argonne National Laboratory. 31 The in-plane strain e k developed in the implanted region is associated with an in-plane stress r k . Provided that the implantation process modifies a superficial region which is thin compared to the thick substrate, we can use Stoney's equation 32 to calculate the mean value of stress in the layer r mean k by measuring the curvature of the implanted wafers.…”
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confidence: 99%