2004
DOI: 10.1016/j.nimb.2003.12.091
|View full text |Cite
|
Sign up to set email alerts
|

Atomic transport in ceramics induced by electronic energy deposition (invited)

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

1
4
0

Year Published

2005
2005
2016
2016

Publication Types

Select...
6
1

Relationship

0
7

Authors

Journals

citations
Cited by 15 publications
(5 citation statements)
references
References 44 publications
1
4
0
Order By: Relevance
“…Bolse et al concluded that Eq. (3) is in good agreement with the values of S et deduced from the mixing experiments for various materials including sapphire as well [25]. Thus it is supported by several independent experiments that Eq.…”
Section: Al 2 Osupporting
confidence: 87%
See 1 more Smart Citation
“…Bolse et al concluded that Eq. (3) is in good agreement with the values of S et deduced from the mixing experiments for various materials including sapphire as well [25]. Thus it is supported by several independent experiments that Eq.…”
Section: Al 2 Osupporting
confidence: 87%
“…[17,[19][20][21][22][23][24][25] justified the validity of Eq. (3) in sapphire with the g and a(0) values typical for insulators.…”
Section: Al 2 Omentioning
confidence: 98%
“…However in this ion regime mixing occurs at interface of Ni/Si for electronic energy loss larger than 25 (8) keV/nm for Ni (Si). Thus the melting of Ni would appear by energy transfer from the Si only at the interface with a mixing rate which is governed by the less sensitive material as expressed by Bolse et al [80].…”
Section: Discussionmentioning
confidence: 97%
“…As the threshold of intermixing is higher compared to metal-oxides/SiO 2 [588], it is assumed that in case of metaloxides/Si the threshold is determined by the Si layer. In contrast to other systems for TiO 2 /Si a nonlinear scaling of the interface broadening with the ion fluence is observed, indicating mixing driven by a chemical solid state reaction.…”
Section: Metal Oxidementioning
confidence: 99%