2009
DOI: 10.1103/physrevb.80.155425
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Atomically thin hexagonal boron nitride probed by ultrahigh-resolution transmission electron microscopy

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Cited by 493 publications
(401 citation statements)
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“…Atomically thin flakes of TMDCs can be peeled from their parent bulk crystals by micromechanical cleavage using adhesive tape 1,[29][30][31][32][33][34][35] , applied to substrates and optically identified by light interference 36,37 , using the same techniques that were developed for graphene. A bulk crystal of MoS 2 is shown in Fig.…”
mentioning
confidence: 99%
“…Atomically thin flakes of TMDCs can be peeled from their parent bulk crystals by micromechanical cleavage using adhesive tape 1,[29][30][31][32][33][34][35] , applied to substrates and optically identified by light interference 36,37 , using the same techniques that were developed for graphene. A bulk crystal of MoS 2 is shown in Fig.…”
mentioning
confidence: 99%
“…Supporting this observation, theoretical calculations predict a higher formation energy for B monovacancies compared to N. 48,49 In contrast, high-resolution transmission electron microscopy (HRTEM) studies have reported recently the formation of point defects in h-BN single-layers, thinned down with a high-energy electron beam. 29,30,50,51 Strikingly, it seems that B vacancies are preferentially formed to N vacancies. It is obvious that, at present, the nature and formation of point defects in h-BN structures is an open unresolved subject on which rely many of its promising properties.…”
Section: Introductionmentioning
confidence: 99%
“…C urrent research in layered materials primarily focuses on graphene [1][2][3][4][5][6][7][8][9][10] , insulating hexagonal boron nitride [11][12][13] , and members from the transition metal dichalcogenides (TMDCs) [14][15][16][17][18][19][20][21] family, such as molybdenum disulphide (MoS 2 ) and tungsten diselenide (WSe 2 ). Graphene transistors suffer from a low on-off current ratio because of its zero-bandgap nature.…”
mentioning
confidence: 99%