“…[1][2][3][4][5][6][7][8] The integration of semiconductor nanowires into device geometries 9 requires control over their morphology, dimensions, growth orientation, crystal phase and structural defects. Catalytic bottom-up approaches, such as vapor-liquid-solid (VLS) [10][11][12] , vapor-solid-solid (VSS) [13][14] , supercritical fluid-liquid-solid (SFLS) [15][16][17] techniques, are popular routes for growing high-aspect ratio one-dimensional nanostructures [18][19] , where nanowire diameters can be controlled by the dimension of the catalysts. 20 Control over nanowire diameters, in turn, facilitates regulation over their growth orientation.…”