Attachment/detachment of Saccharomyces cerevisiae on plasma deposited organosilicon thin films

Abstract

Bio-interactive and bio-inert materials prepared by plasma deposition of organosilicon thin films on polycarbonate substrates were studied and described in this communication. The atmospheric pressure surface barrier discharge was applied. Nitrogen with small admixture of hexamethyldisiloxane (HMDSO) was used as plasma discharge gas. The zeta potential measurement followed by cell adhesion to polystyrene was used to find optimal values of stability of the cell suspension and cell adhesion to the tested surfaces. The samples of plasma deposited layers were characterized by contact angle measurement.

Plasma induced patterning of polydimethylsiloxane surfaces

“…Plasma treatment can be used to remove organic contaminants from samples, for surface activation, and for deposition of materials on a substrate [20][21][22]. RF plasmas are composed of ionized gases, at reduced pressure, and are often used to activate a silicon or polymer surface, converting a native hydrophobic surface to a hydrophilic one [23,24].…”

Plasma‐Mediated Nanosilver‐Organosilicon Composite Films Deposited on Stainless Steel: Synthesis, Surface Characterization, and Evaluation of Anti‐Adhesive and Anti‐Microbial Properties on the Model Yeast Saccharomyces cerevisiae

“…The organosilicon coating could act as a non‐conductive “barrier film” by masking the oxide layer of stainless steel, thus avoiding interactions with the cell wall components. In their study on hydrophobic organosilicon thin films deposited on polycarbonate surfaces by an atmospheric pressure surface barrier discharge, Lehocky et al21 also observed a drastic reduction of S. cerevisiae adhesion, compared to the untreated substrate. However, the anti‐adhesive efficiency of film A was lower than that previously reported for a silica‐like matrix,50 probably due to a decrease in surface wettability (fourfold increase in water contact angle for the organosilicon matrix, results not shown).…”

“…However, this strategy is limited by a multi‐step and time‐consuming chemical route. To overcome these problems, single‐step processes, using plasma deposition, have been developed 15, 17–21. In this framework, plasma‐assisted nanosilver technology, based on the combination of plasma polymerization and simultaneous silver sputtering, was shown to achieve the desired surface modifications for biofilm‐targeted applications.…”

“…However, potentialities of HMDSO plasma‐polymerized films for biofilm‐targeted applications are poorly described in the literature. Lehocky et al21 prepared hydrophobic organosilicon thin films deposited on polycarbonate surfaces by an atmospheric pressure surface barrier discharge. By increasing operating parameters such as HMDSO feed rate and deposition time, the authors observed a decrease in the total surface free energy, correlated with a weak or even no adhesion of S. cerevisiae cells, compared to bare polycarbonate.…”

Adhesion of Rhodococcus sp. S3E2 and Rhodococcus sp. S3E3 to plasma prepared Teflon-like and organosilicon surfaces

“…However, as mentioned by Lehocký et al (2007) before, deposition strongly depends on the used cell system and process conditions. The cell attachment also depends on the physical and chemical properties of the surface, i.e., interfacial free energy, hydrophobicity, mobility of the surface groups, etc., as demonstrated by Lehocký et al (2006). is recognized.…”