2000
DOI: 10.1016/s0168-583x(00)00290-1
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Au–Si eutectic alloy formation by Si implantation in polycrystalline Au

Abstract: Di erent doses of high-energy Si (0.2±4.5 MeV) were implanted in polycrystalline Au foils (35 lm thick) to form a low melting point Au±Si alloy which can be used for gold soldering. A Au±Si eutectic structure has been observed in the implanted Au foils after annealing at 400°C for 1 h. The Au±Si liquid phase was di used in the polycrystalline Au foil along the grain boundaries which were¯attened by the initial rolling procedure. The presence of this eutectic alloy was also observed on the back of the Au foil. … Show more

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Cited by 5 publications
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“…The ERDA technique has been widely used to measure the hydrogen content of surface oxide layers [181][182][183]. A 10 μm thick mylar film is attached in front of the ERDA detector to absorb all the scattered and recoiled atoms except hydrogen.…”
Section: Ion Beam Analysis (Iba)mentioning
confidence: 99%
“…The ERDA technique has been widely used to measure the hydrogen content of surface oxide layers [181][182][183]. A 10 μm thick mylar film is attached in front of the ERDA detector to absorb all the scattered and recoiled atoms except hydrogen.…”
Section: Ion Beam Analysis (Iba)mentioning
confidence: 99%