Auger Electron Spectroscopy for Surface Analysis

Glow Discharge Polymerization of Tetrafluoroethylene, 1,1 Difluoroethylene, and Chlorotrifluoroethylene

“…X-ray photoelectron spectra, commonly referred to as ESCA, were measured on a dispersion-compensated monochromatized spectrometer using AI(Ka) radia- XPS is surface sensitive due to the short path length of the escaping photoelectrons. For example, 90% of the intensity comes from the top 3.5 (35A), 2.3 (23A), 3.7 (37A) nM for the C(ls), F(ls), and Cl(2p) electrons, respectively, if one uses the escape depths published for homogeneous materials (6). There is considerable debate regarding the applicability of these escape depths to amorphous systems and the actual escape depth may be twice that given above.…”

Some considerations of the limitations of the Auger-depth-profiling technique as applied to silver metal and (100) surfaces of indium phosphide

“…As a consequence, during any profiling experiment involving an originally contaminated surface, some of the contaminants will be forced into the bulk material. Because the Auger technique analyses only to a depth of some lOA (Tracy 1972) the profile will present a penetration of surface contaminants that is considerably greater than that which was present originally dispersed through the material. In addition, during electron beam bombardment, the thermally activated diffusion of these surface contaminants to the surface can occur with, in this instance, for both silver and indium phosphide, the appearance of various transitions of increasing strength with increasing time of exposure to the electron beam.…”

The compositional and structural changes that accompany the thermal annealing of (100) surfaces of GaAs, InP and GaP in vacuum

“…The exact depth depended upon the escape depth of the electron which in turn depended upon the material and the energy of the photoemission. Typically, the technique sampled material to some 50A below the surface (Tracy 1973).…”