Auto-correlation function analysis of phase formation in iron ion-implanted amorphous silicon layers

Yang, Tsu-Ching; Chueh, Yu‐Lun; Chen, H.C; Chen, L.J; Chou, Li‐Wei

doi:10.1016/j.tsf.2004.02.085

Cited by 5 publications

(2 citation statements)

References 29 publications

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“…Ion-beam synthesis is used in particular to produce a thin film of iron silicide on the silicon surface [7,8]. Several types of silicides (FeSi 2 , FeSi, and Fe 3 Si) are concurrently formed during the Fe-ion implantation into silicon matrix [9]. Therefore, it is difficult to obtain materials with a preferred phase.…”

Section: Introductionmentioning

confidence: 99%

Investigation of various phases of Fe–Si structures formed in Si by low energy Fe ion implantation

Lakshantha

Dhoubhadel

Reinert

et al. 2015

Nuclear Instruments and Methods in Physics Research Section B:

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Section: Introductionmentioning

confidence: 99%

Investigation of various phases of Fe–Si structures formed in Si by low energy Fe ion implantation

Lakshantha

Dhoubhadel

Reinert

et al. 2015

Nuclear Instruments and Methods in Physics Research Section B:

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“…Mainly, three stable silicides (FeSi 2 , FeSi, and Fe 3 Si) are possible in this process. [19][20][21] Since the properties of iron silicide are strongly dependent on the phase, chemical state analysis of iron silicide is important. X-ray photoelectron spectroscopy (XPS) can be used to analyze the chemical state.…”

Section: Introductionmentioning

confidence: 99%

Formation and characterization of embedded Fe3Si binary structures in Si

Lakshantha

McDaniel

Rout

2019

Journal of Applied Physics

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Chemical and electronic properties of ion beam synthesized Fe-Si binary structures are studied using X-ray photoelectron spectroscopy binding energy analysis. Ferromagnetic Fe-Si (Fe 3 Si) binary structure formation is enhanced in the ion-beam synthesis process by applying an in situ external magnetic field parallel to the Si substrate during the Fe implantation. Core-level analysis shows features corresponding to chemical environments of different Fe-Si phases. Fe 2p 3/2 and Fe 3s peaks were analyzed, considering peak position, symmetry, and splitting. The ferromagnetic Fe 3 Si phase shows a highly asymmetric 2p 3/2 peak at 706.6 eV and peak splitting in the 3s peak due to the exchange interaction with unfilled 3d electrons in the valance band. In contrast, the Si core-level did not show any significant features leading to the identification of Fe-Si binary compounds. The Si 2p peak showed a constant 0.2 eV peak shift toward the high-energy side compared to the elemental Si. Further valance band spectra reveal distinct features to help identify the Fe 3 Si phase. In general, core and valance band features of Fe-Si binary compounds provided definitive information about Fe 3 Si phase identification and its electronic structure with direct evidence of the exchange interaction, which occurs between core levels, valance band, and the unfilled 3d shell.

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Formation of iron and iron silicides on silicon and iron surfaces. Role of the deposition rate and volumetric effects

et al. 2012

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Auto-correlation function analysis of phase formation in iron ion-implanted amorphous silicon layers

Cited by 5 publications

References 29 publications

Investigation of various phases of Fe–Si structures formed in Si by low energy Fe ion implantation

Investigation of various phases of Fe–Si structures formed in Si by low energy Fe ion implantation

Formation and characterization of embedded Fe3Si binary structures in Si

Formation of iron and iron silicides on silicon and iron surfaces. Role of the deposition rate and volumetric effects

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