2021
DOI: 10.1017/s1431927621013866
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Automated SEM Image Analysis of the Sphere Diameter, Sphere-Sphere Separation, and Opening Size Distributions of Nanosphere Lithography Masks

Abstract: Colloidal nanosphere monolayers—used as a lithography mask for site-controlled material deposition or removal—offer the possibility of cost-effective patterning of large surface areas. In the present study, an automated analysis of scanning electron microscopy (SEM) images is described, which enables the recognition of the individual nanospheres in densely packed monolayers in order to perform a statistical quantification of the sphere size, mask opening size, and sphere-sphere separation distributions. Search… Show more

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Cited by 3 publications
(1 citation statement)
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“…Pillars generated with the proposed method have much better smoothness over PDMS patterns made from a SU8 mold generated by standard photolithography using a 64k DPI chrome mask. The Root Mean Square (RMS) value of the deviation of the distances from the center provides a quantitative measure of the roughness 62,63 . For this case, the RMS of the pillar diameter for PEGDA and PDMS devices are 0.79 µm and 1.99 µm, respectively, meaning PEGDA has a much smoother side surface profile than PDMS devices.…”
Section: Prototyping Of a Large Array Of Structures For Dld Applicationmentioning
confidence: 99%
“…Pillars generated with the proposed method have much better smoothness over PDMS patterns made from a SU8 mold generated by standard photolithography using a 64k DPI chrome mask. The Root Mean Square (RMS) value of the deviation of the distances from the center provides a quantitative measure of the roughness 62,63 . For this case, the RMS of the pillar diameter for PEGDA and PDMS devices are 0.79 µm and 1.99 µm, respectively, meaning PEGDA has a much smoother side surface profile than PDMS devices.…”
Section: Prototyping Of a Large Array Of Structures For Dld Applicationmentioning
confidence: 99%