Automatic stitching of micrographs using local features

Abstract

Combination of single images to panoramic views is a popular application of image stitching in digital photography. By applying the same principle to micrographs, a number of common limitations of microscopes such as aberrations or limited depth of field may be overcome. This paper adapts recent methods of image registration for different application areas in light-and electron microscopy. Especially the suitability of SIFT and SURF features for micrograph correspondence analysis is in the focus of investigations. Test scenarios covering a wide range of magnifications and image contents are discussed. Additionally, the acquisition of the single scans and finally the complete generation of high-resolution panoramic micrographs may be automated. The proposed system is not only suitable as a tool for surface inspections, but also as a navigational aid for microand nanorobotic applications.

Registration of AFM and SEM Scans Using Local Features

“…Up to now, there are only a few applications of SIFT and SURF in microscopy. Image stitching for light microscopy using SURF has been demonstrated (Wortmann 2010) recently. Because preliminary investigations indicated promising results for a number of applications of AFM and SEM registration, SIFT and SURF are further pursued here.…”