Toward the large-area deposition of MoS 2 layers, we employ metal−organic precursors of Mo and S for a facile and reproducible van der Waals epitaxy on c-plane sapphire. Exposing c-sapphire substrates to alkali metal halide salts such as KI or NaCl together with the Mo precursor prior to the start of the growth process results in increasing the lateral dimensions of single crystalline domains by more than 2 orders of magnitude. The MoS 2 grown this way exhibits high crystallinity and optoelectronic quality comparable to singlecrystal MoS 2 produced by conventional chemical vapor deposition methods. The presence of alkali metal halides suppresses the nucleation and enhances enlargement of domains while resulting in chemically pure MoS 2 after transfer. Field-effect measurements in polymer electrolyte-gated devices result in promising electron mobility values close to 100 cm 2 V −1 s −1 at cryogenic temperatures. KEYWORDS: Chemical vapor deposition, two-dimensional transition metal dichalcogenides, nucleation and growth, microstructure engineering, FET devices T he chemical vapor deposition of two-dimensional materials is a highly promising method to produce atomically thin layers at a large scale for harnessing their attractive properties. Monolayer MoS 2 is a model 2D semiconductor that can be used to realize field-effect transistors with high current on/off ratios. 1 It is a naturally occurring material with a good chemical stability that exhibits a wide range of attractive properties such as a spin−orbit couplinginduced band splitting, 2,3 a mechanically tunable bandgap, 4−8 and a low temperature superconductivity. 9−13 Toward the large-scale synthesis of MoS 2 thin films, a conventional chemical vapor deposition method of producing MoS 2 monolayers typically involves low vapor pressure solid powder precursors such as MoO 3 and sulfur. It has been investigated for centimeter-scale deposition of polycrystalline monolayer MoS 2 with grain sizes of nanometer to micrometer and with controllable coverage. 14,15 However, low vapor pressures of the solid precursors require them to be loaded inside a heated zone of the reactor chamber leading to a limited control over the vapor phase composition and deposition rate. Thus, this synthesis approach heavily undermines the ability to control the nucleation density, thickness, and coverage.Here, we aim to address this issue by employing well-known metal−organic precursors of molybdenum, Mo(CO) 6 , which is a high vapor pressure solid, and of sulfur, H 2 S in gas phase. 16−19 This metal-organic chemical vapor deposition (MOCVD) approach allows reliably setting the concentration of precursor gases within the gaseous mixture that is transported to the substrate by controlling the evaporation rates of the solid precursor and mass flow rates. An extensive vapor phase thermodynamics study performed by Kumar et al. 19 has shown that growth temperatures above 850°C at atmospheric pressure lead to layer-by-layer growth of MoS 2 without extraneous deposition of carbon ...