“…Gallium oxide (Ga 2 O 3 ), a 4.9–5.2 eV wide-band-gap semiconductor with large near band edge absorption coefficient, high thermodynamic stability, and great chemical stability, is considered to be one of the mainstream materials for fabricating SBUV detectors. – Recently, a variety of methods used to grow Ga 2 O 3 materials have been developed, such as MOCVD, PLD, and magnetron sputtering. – However, these methods require strict processes and costly equipment, which has prevented the large-scale manufacturing and application of Ga 2 O 3 SBUV photodetectors. Of course, the solution-processed films have been widely applied to the preparation of photosensitive layers in Ga 2 O 3 SBUV detectors due to the simple process, low cost, and large-area growth, but most reported SBUV detectors based on this kind of films tend to exhibit low photoresponsivity and slow response. – Regarding this situation, it has been confirmed that some unintentional doping defects, such as oxygen vacancies, carbon (C) impurities, hydrogen (H) impurities, etc., are easily formed in the solution-processed Ga 2 O 3 films due to the extremely low formation energy. – These impurity defects that are prone to becoming carrier capture centers will be important factors attenuating the photoresponsivity and response speed.…”