We report on time-and spatially resolved photoluminescence measurements using InP/GaInAs/InP double hetero structures (DH-structures) to determine the crucial minority carrier lifetime for the Ga 0.47 In 0.53 As to InP interface which is basic for optoelectronic and photovoltaic applications.
Different preparation routes, such as group III-and group V-rich variations are presented with respect to their lifetimes, interface recombination velocity and lateral interface homogeneity. From a series of different thick DHstructures at a fixed excitation density for chosen interface preparation routes the bulk lifetime and interface recombination velocity are extracted. Overall low interface recombination velocities occur, while one group III-rich preparation route results in comparable lifetimes at all excitation densities to the group V-rich preparation but with a much higher lateral homogeneity.Index Terms -III-V semiconductor materials, indium gallium arsenide, photoluminescence, charge carrier lifetime, surface structures.