Basic structures for photonic integrated circuits in Silicon-on-insulator

Bogaerts, Wim; Taillaert, Dirk; Luyssaert, Bert; Dumon, Pieter; Campenhout, Joris Van; Bienstman, Peter; Thourhout, Dries Van; Baets, Roel; Wiaux, Vincent; Beckx, S.

doi:10.1364/opex.12.001583

Cited by 258 publications

(145 citation statements)

References 7 publications

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“…The substrate provides optical isolation either by having a smaller refractive index than the device layer, or by its selective removal 1 . Single-crystal diamond is one example from an extensive list of materials-many with attractive optical properties-for which high-quality thin film heterolayer structures do not exist.…”

mentioning

confidence: 99%

High quality-factor optical nanocavities in bulk single-crystal diamond

et al. 2014

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Single-crystal diamond, with its unique optical, mechanical and thermal properties, has emerged as a promising material with applications in classical and quantum optics. However, the lack of heteroepitaxial growth and scalable fabrication techniques remains the major limiting factors preventing more wide-spread development and application of diamond photonics. In this work, we overcome this difficulty by adapting angled-etching techniques, previously developed for realization of diamond nanomechanical resonators, to fabricate racetrack resonators and photonic crystal cavities in bulk single-crystal diamond. Our devices feature large optical quality factors, in excess of 10 5 , and operate over a wide wavelength range, spanning visible and telecom. These newly developed high-Q diamond optical nanocavities open the door for a wealth of applications, ranging from nonlinear optics and chemical sensing, to quantum information processing and cavity optomechanics.

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confidence: 99%

High quality-factor optical nanocavities in bulk single-crystal diamond

et al. 2014

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“…The fabrication procedure is described in detail in [5,13]. The structures are defined in a triangular lattice of air holes extending through the top silicon-layer, with a lattice constant L ¼ 435 nm and regular hole diameter d ¼ 0.53L.…”

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confidence: 99%

Bandwidth engineering of photonic crystal waveguide bends

Borel¹,

Frandsen²,

Harpøth³

et al. 2004

Electron. Lett.

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An effective design principle has been applied to photonic crystal waveguide bends fabricated in silicon-on-insulator material using deep UV lithography resulting in a large increase in the low-loss bandwidth of the bends. Furthermore, it is experimentally demonstrated that the absolute bandwidth range can be adjusted in a post-fabrication thermal oxidation process.Introduction: The planar photonic crystal waveguide (PhCW) has numerous potential applications because of its unique capability to control the propagation of light by utilising the photonic bandgap (PBG) effect [1,2]. This effect allows the interaction between light and the PhCW to take place on a minute scale [3,4]. Thereby, the overall size of optical components based on PhCW structures may be greatly minimised and, correspondingly, device packing density increased. Recent advances in deep UV lithography at 248 nm [5] have made mass fabrication of optical ultra-compact PhCW devices viable by employing existing fabrication methods commonly encountered in the semiconductor electronics industry.Research has now reached a level where existing fabrication technologies allow manufacture of PhCW structures with low propagation losses [6][7][8][9]. Hence, there is presently worldwide focus on the design and fabrication of PhCW structures possessing adequate bandwidths. PhCW structures with 20-40 nm useful optical bandwidths have previously been demonstrated [3,10,11]. Recently, Borel et al. [12] have demonstrated that a new inverse design method, topology optimisation, can be utilised to dramatically increase the bandwidth of a PhCW component. However, some of the holes in these components have special sizes and shapes that currently cannot be manufactured using deep UV lithography and, thus, cannot currently be mass fabricated. Except for these topology-optimised structures, no bandgap-based PhCW components have been demonstrated with satisfactory performance in a broad wavelength range.In this Letter, we present an alternative design strategy, which also leads to large bandwidths of PhCW bends, and that is suitable for fabrication utilising deep UV lithography. Furthermore, we demonstrate a simple experimental procedure employing thermal oxidation on how to tune the absolute position of the operational bandwidth for an already fabricated batch of samples.

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“…[7][8][9][10] One of the obvious advantages of using semiconductor materials is the high dielectric contrast, which is critical for providing a complete band gap. However, this method requires expensive and large-scale equipment.…”

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confidence: 99%

Predication of multi-dimensional photonic crystal structures generated by multi-beam interference in holographic lithography

Chicharo

2005

Smart Mater. Struct.

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Photonic crystals (PCs) are synthetic micro-structures which have periodical refraction index variations and produce photonic band gaps similar to electronic band gaps produced by the crystal potentials of semiconductors. Different methods have been proposed and demonstrated to fabricate two-or three-dimensional photonic crystal structures. Among them, the holographic lithography method, in which multi-beam interference is employed, offers a number of advantages, including its ability to create large volume of periodic structures through an irradiation process, the uniformity of period, and more degrees of freedom to control the structures. In this study, a multi-beam interference model is presented for predicting the mulit-dimensional photonic crystal structures. Various parameters, including beam propagation and polarization directions, beam intensities, and phase shifts are considered. Calculations have been carried out to simulate two four-beam configurations which have been popularly used in the fabrication of photonic crystals. It has been demonstrated that the contours of the interference pattern are related to the polarization states, the intensity ratios among the four beams, and the phase delays. Therefore, by controlling the beam intensities, polarization directions, and phase delays, different structures can be obtained. The results presented in this study provide a useful guide for choosing various optical parameters and selecting proper photoresists to fabricate 2D and 3D photonic crystal structures.

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Basic structures for photonic integrated circuits in Silicon-on-insulator

Cited by 258 publications

References 7 publications

High quality-factor optical nanocavities in bulk single-crystal diamond

High quality-factor optical nanocavities in bulk single-crystal diamond

Bandwidth engineering of photonic crystal waveguide bends

Predication of multi-dimensional photonic crystal structures generated by multi-beam interference in holographic lithography

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