Conference on Lasers and Electro-Optics 2021
DOI: 10.1364/cleo_si.2021.sw2f.7
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Be-doping assessment in Self-Catalyzed MBE Grown GaAs Nanowires

Abstract: We report on the Be-dopant assessment in Ga-assisted molecular beam epitaxially grown nanowires using conductive-atomic force microscopy, X-ray photoelectron spectroscopy, and ultraviolet photoelectron spectroscopy.

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Cited by 5 publications
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“…Based on the axial growth rate of each segment, the overall segment growth duration was determined. In the growth of GaAsSb p-i-n NWs, gallium telluride (GaTe) captive source at the source temperature of 520 °C was used to achieve the carrier concentration of ∼5 × 10 18 cm −3 [24,25] and beryllium (Be) was used as a p-dopant at the source temperature of 920 °C to achieve the dopant concentration of 5 × 10 17 cm −3 [26,27]. During the i-segment growth, the intrinsic p-type nature of i-GaAsSb NWs is compensated by the intermittent supply of Te using a GaTe captive source, as Te being a group VI element is found to be a well-behaved n-type dopant [24,25,28] replacing group V elements, As and Sb, at low growth temperatures.…”
Section: Methodsmentioning
confidence: 99%
“…Based on the axial growth rate of each segment, the overall segment growth duration was determined. In the growth of GaAsSb p-i-n NWs, gallium telluride (GaTe) captive source at the source temperature of 520 °C was used to achieve the carrier concentration of ∼5 × 10 18 cm −3 [24,25] and beryllium (Be) was used as a p-dopant at the source temperature of 920 °C to achieve the dopant concentration of 5 × 10 17 cm −3 [26,27]. During the i-segment growth, the intrinsic p-type nature of i-GaAsSb NWs is compensated by the intermittent supply of Te using a GaTe captive source, as Te being a group VI element is found to be a well-behaved n-type dopant [24,25,28] replacing group V elements, As and Sb, at low growth temperatures.…”
Section: Methodsmentioning
confidence: 99%
“…% to tune the absorption wavelengths in the APD structure from 0.95 to 1.3 μm, corresponding to a band gap PL emission range of ∼1.25 to ∼0.95 eV (Supporting S1c). An optimum doping concentration and segment thickness were extracted from E -field simulations (using COMSOL Multiphysics) of the structures of varying segment thicknesses and doping profiles (Supporting S2) that would provide E -field strength >1 × 10 5 V/cm in the multiplication region to initiate the avalanche mechanism. , The doping density of each segment was calculated experimentally using a combination of X-ray photoelectron spectroscopy/ultraviolet photoelectron spectroscopy (XPS/UPS) and conductive atomic force microscopy (C-AFM)/scanning Kelvin probe microscopy based on our earlier work by Ramaswamy et al. , and Devkota et al The Be- and Te-doping density of different segments was estimated using a combination of XPS/UPS, , from quantifying the corresponding shift in the Fermi level toward the valance and conduction bands, respectively. These values were further confirmed from electron/hole densities computed from I – V characteristics of C-AFM measurements of the single nanowire (SNW).…”
Section: Methodsmentioning
confidence: 99%
“…18–21) in the absorption region. GaTe and Be source materials were used for segmental doping at 540 °C and 925 °C, yielding n-type doping ∼ 10 18 /cm −3 and p-type doping ∼ 5 × 10 17 /cm −3 , 22 respectively. A p + -contact layer with Be cell temperature of 925 °C and a group V/III flux ratio of 10 was used for ∼4 at% Sb incorporation in the segment.…”
Section: Methodsmentioning
confidence: 99%