Beam optics in nuclear microprobe: A review

Ponomarev, A.G.; Ponomarov, Artem

doi:10.1016/j.nimb.2021.03.024

Cited by 8 publications

(1 citation statement)

References 81 publications

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“…Traditionally, the lateral resolving power of Rutherford backscattering spectrometry is improved by focusing the primary ion beam. However, the key issues with focusing the beam to below the sub-micrometre regime are the reduced ion beam current and the concomitant impractical analysis time, and the highly localised fluence causing detrimental beam damage 11 , 21 , 22 . Here we instead probe a large ensemble of nanostructures simultaneously, thereby drastically enhancing the sensitivity and avoiding the beam damage.…”

Section: Introductionmentioning

confidence: 99%

Quantification of area-selective deposition on nanometer-scale patterns using Rutherford backscattering spectrometry

Claessens

Khan

Haghighi

et al. 2022

Sci Rep

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We present a site-specific elemental analysis of nano-scale patterns whereby the data acquisition is based on Rutherford backscattering spectrometry (RBS). The analysis builds on probing a large ensemble of identical nanostructures. This ensures that a very good limit of detection can be achieved. In addition, the analysis exploits the energy loss effects of the backscattered ions within the nanostructures to distinguish signals coming from different locations of the nanostructures. The spectrum deconvolution is based on ion-trajectory calculations. With this approach, we analyse the Ru area-selective deposition on SiO2-TiN line-space patterns with a linewidth of 35 nm and a pitch of 90 nm. We quantify the selectivity and the Ru local areal density on the top versus on the sidewall of the SiO2 lines. The sensitivity to probe ruthenium deposited on the various surfaces is as low as 1013 atoms/cm2. The analysis is quantitative, traceable, and highly accurate thanks to the intrinsic capabilities of RBS.

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Section: Introductionmentioning

confidence: 99%