2017 IEEE International Electron Devices Meeting (IEDM) 2017
DOI: 10.1109/iedm.2017.8268312
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BEOL Based RRAM with one extra-mask for low cost, highly reliable embedded application in 28 nm node and beyond

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Cited by 40 publications
(13 citation statements)
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“…The next-generation memory should be ultrafast as a static random access memory (SRAM) and possess non-volatility and high-density as a flash memory 4 , to overcome the large storage performance gap between different levels of the memory hierarchy. Of all the potential candidates, including phase-change RAM (PCRAM) 5,6 , magnetoresistive RAM (MRAM) 7,8 , and resistive RAM (ReRAM) 9,10 , a recently developed non-volatile resistive-type memory based on ferroelectric tunnel junction (FTJ) shows special advantages [11][12][13][14] . Especially, the write current density of an FTJ is as low as 10 3 -10 4 A cm −2 , while the typical values are about 10 6 A cm −2 in the former three types of memories.…”
mentioning
confidence: 99%
“…The next-generation memory should be ultrafast as a static random access memory (SRAM) and possess non-volatility and high-density as a flash memory 4 , to overcome the large storage performance gap between different levels of the memory hierarchy. Of all the potential candidates, including phase-change RAM (PCRAM) 5,6 , magnetoresistive RAM (MRAM) 7,8 , and resistive RAM (ReRAM) 9,10 , a recently developed non-volatile resistive-type memory based on ferroelectric tunnel junction (FTJ) shows special advantages [11][12][13][14] . Especially, the write current density of an FTJ is as low as 10 3 -10 4 A cm −2 , while the typical values are about 10 6 A cm −2 in the former three types of memories.…”
mentioning
confidence: 99%
“…A TaOx switching layer was formed in the trench of M1 in connection with CT. An interface layer with a thickness of 1.5 nm∼5 nm was formed between the TaOx layer and TE. The detailed process flow of the RRAM device can be found in our previous work [14]. Figure 2c illustrates the typical DC I-V characteristics of the RRAM cell measured at room temperature, demonstrating a low 80 µ A switching current and a low operation voltage below 1.5 V. During the DC test, the bias voltage of the transistor (NMOS) is 1.4 V due to the need for current limiting protection of the RRAM device during the set operation, while the SL is grounded, and the BL provides different DC voltages.…”
Section: Trng Based On Rrammentioning
confidence: 99%
“…Low HRS/LRS ratio can become a potential problem for 2T2R gate operation since voltage drop over RRAM in LRS becomes comparable to RRAM in HRS. However, with RRAM resistance ratio up to 10 2 or 10 3 [32,33], correctness of the logic operations can be guaranteed. Lifetime of this 2T2R logic gate is also dependent upon endurance of RRAM, for which the best performance is reported to be 10 12 cycle [31].…”
Section: Op4: P' = Q→p (Imp) and Q'= P•q (And)mentioning
confidence: 99%